System and method for searching defects based on pattern identification

A graphic recognition and retrieval system technology, applied in character and pattern recognition, special data processing applications, instruments, etc., can solve the problems of consuming a lot of manpower and material resources, find relevant materials, etc., and achieve the effect of saving manpower and material resources

Inactive Publication Date: 2013-03-20
SHANGHAI HUALI MICROELECTRONICS CORP
View PDF3 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

for figure 1 The defect database of the company can only be queried by keywords, so even if the defect database has been established, it is impossible to find relevant information from the database

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • System and method for searching defects based on pattern identification
  • System and method for searching defects based on pattern identification
  • System and method for searching defects based on pattern identification

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0032] The embodiments of the present invention will be described below through specific examples and in conjunction with the accompanying drawings, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific examples, and various details in this specification can also be modified and changed based on different viewpoints and applications without departing from the spirit of the present invention.

[0033] figure 2 It is a system architecture diagram of a defect retrieval system based on graphic recognition of the present invention. like figure 2 As shown, a defect retrieval system based on graphic recognition of the present invention at least includes: a defect database establishment module 201 , a picture receiving module 202 , an extraction module 203 , a comparison module 204 and a compa...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a system and a method for searching defects based on pattern identification. The method comprises the following steps of establishing a defect database, calculating each defect pattern in the defect database by a pattern boundary contour algorithm, and respectively and correspondingly establishing contour feature data of each defect; receiving the inputted image of the defect to be found; operating the image of the defect to be found by the pattern boundary contour algorithm to obtain the contour feature data; comparing the extracted contour feature data with the contour feature data established in the defect database; and according to the comparison result, finding the same or similar defect data information from the defect database and the related solutions. The system and the method have the advantages that the defect database can be searched, and the labor, the material and the resource are saved.

Description

technical field [0001] The present invention relates to a defect retrieval system and method based on graphic recognition, in particular to a defect retrieval system and method based on graphic recognition in an integrated circuit manufacturing process. Background technique [0002] With the continuous improvement of integrated circuit technology, the minimum design size is also continuously reduced, and the impact of defects on yield is increasing. more and more complicated. [0003] At present, the most commonly used and most intuitive way of expressing defects is graphics. figure 1 It is a schematic diagram of a defect database commonly used in the prior art. for figure 1 The defect database of the company can only be queried by keywords, so even if the defect database has been established, it is impossible to find relevant information from the database through retrieval, and can only rely on the accumulation of original experience to find problems, and it often takes ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G06F17/30G06K9/00
Inventor 龙吟范荣伟王洲男倪棋梁陈宏璘
Owner SHANGHAI HUALI MICROELECTRONICS CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products