Two-degree-of-freedom nanometer positioning platform

Abstract

The invention discloses a two-degree-of-freedom nanometer positioning platform. The nanometer positioning platform comprises a movable platform and a base which are connected with each other through a flexible branched chain in an x-axis direction and a flexible branched chain in an y-axis direction. As adopting a flexible parallel connection structure, the nanometer positioning platform has the advantages of high rigidity, high precision, low inertia, compact structure, no error accumulation and the like; and as adopting a flexible plate spring as a transmission component, the nanometer positioning platform has the advantages of no mechanical friction and no gap. Furthermore, based on the elastic deformation of materials, the tiny deformation generated by the flexible plate spring and a tiny working space at the tail end of an actuator, the nanometer positioning platform can effectively eliminate the defects of non-linearity and the like of a parallel connection mechanism; and two piezoelectric ceramic drivers are used for respectively driving the two flexible branched chains, so that a relative position of a template and a substrate in an imprint lithography process can be initiatively adjusted. The two-degree-of-freedom nanometer positioning platform provided by the invention can be taken as an auxiliary positioning platform of a nanometer imprint lithography positioning system, and can implement micro-scale feeding and precise positioning.

Description

technical field [0001] The invention belongs to a micro / nano precision workbench, in particular to a two-degree-of-freedom parallel flexible precision positioning workbench which can provide precise plane positioning in the fields of micro / nano surface measurement and micro / nano operation. Background technique [0002] Nanodevices include nanoelectronic devices and nanophotoelectric devices, which can be widely used in electronics, optics, micromechanical devices, new computers, etc. , intelligent, high integration and other mainstream development directions. Due to the potential huge market and national defense value of nanodevices, the methods, approaches and processes of its design and manufacture have become the research and investment hotspots of many scientists, governments and large enterprises. At present, the design and manufacture of nano-devices are in a period of rapid development. There are various methods, and patterning technology is one of them. [0003] Na...

AI Technical Summary

Problems solved by technology

Among these existing technologies, although the self-adaptive adjustment precision positioning system is simple in structure, compact in structure and low in cost, its positioning accuracy, especially the adjustment accuracy of parallelism is low, which limits the improvement of processing accuracy and quality

Although the parallelism between the imprint template and the substrate can be improved to a certain extent through active leveling and manual adjustment mechanisms, it cannot compensate for the parallelism error between the template and the substrate due to uneven imprint force during the imprinting process

The airbag cylinder type imprinting system overcomes the disadvantages that the silicone is easily stretched and deformed during the imprinting process, the imprinting force is unevenly distributed, and the template is easy to break. However, the design and use of the vacuum chamber is expensive and the imprinting time is too long.

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