Laser CVD coating equipment

Abstract

The invention provides laser CVD (Chemical Vapor Deposition) coating equipment. The equipment includes an upper housing and a lower housing, wherein the upper housing is covered on the lower housing to form a sealed CVD chamber body; a plane positioning device used for driving a material to be coated to move in the plane and determining the position is arranged in the upper housing, and the material to be coated is arranged on the plane positioning device; an air-injection device used for ejecting working gas and a laser focusing device used for focusing a laser source at the front end of a jet of the air-injection device are arranged in the lower housing; the material to be coated is positioned at the front end of the jet of the air-injection device and is opposite to the air-injection device; the plane positioning device consists of a first sliding slot and a second sliding slot perpendicular to the first sliding slot; a first slider is arranged in the first sliding slot; a second slider is arranged in the second sliding slot; the first slider is connected to the second slider; a mounting plate is arranged on the second slider; and the material to be coasted is attached to the mounting plate. The method has the advantages of high coating efficiency, low probability of damaging the material to be coated, uniform thickness of a coated product and smooth coating surface.

Description

technical field [0001] The invention belongs to the technical field of chemical vapor deposition (CVD), in particular to a laser CVD coating equipment. Background technique [0002] Chemical vapor deposition (English: Chemical Vapor Deposition, CVD for short) is a chemical technique used to produce solid materials with high purity and good performance. The semiconductor industry uses this technique to grow thin films. A typical CVD process is to expose the wafer (substrate) to one or more different precursors, and a chemical reaction or / and chemical decomposition occurs on the surface of the substrate to produce the film to be deposited. Different by-products are usually produced during the reaction process, but most of them will be taken away with the air flow instead of staying in the reaction chamber. [0003] Chemical vapor deposition technology has been widely used in the field of coating. In the existing technology, the heating method of the working gas is generally ...

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Problems solved by technology

[0003] Chemical vapor deposition technology has been widely used in the field of coating. In the existing technology, the heating method of the working gas is generally to use infrared heating gas or heating the material to be coated to promote the chemical reaction of the gas. The efficiency of using infrared heating gas is low. The thickness of the coated film is not uniform, the surface of the coating is rough, and the way of heating the material to be coated is easy to burn the material

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