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Lifting device of etching baking equipment

A technology of lifting device and baking equipment, applied in the field of lifting device, can solve problems such as poor sealing, and achieve the effect of overcoming poor sealing

Active Publication Date: 2015-01-07
HANGZHOU SILAN AZURE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] An object of the present invention is to provide a lifting device used in chlorine gas or chloride etching baking equipment, which has the functions of lifting and automatically sealing the reaction furnace at the same time, thereby overcoming the problem of poor sealing previously mentioned

Method used

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  • Lifting device of etching baking equipment
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Embodiment Construction

[0017] The structure and operation process of the preferred embodiment of the present invention will be described below with reference to the accompanying drawings, wherein the same reference numerals represent the same components.

[0018] figure 1 It shows a perspective view of the lifting device of the etching and baking equipment of the present invention. As shown in the figure, the lifting device is mainly composed of a lifting mechanism 1 , an exhaust gas collector 2 and a cylinder assembly 3 . for your convenience, figure 1 The lifting device in is rotated 90° clockwise relative to the actual use position. That is to say, figure 1 The left side of the lifting device in corresponds to the lower position in actual use, while the right side corresponds to the upper position in actual use.

[0019] The two ends of the lifting mechanism 1 are fixed on the upper platen 5 above the etching and baking equipment and the lower platen 4 below, so that the lifting mechanism 1 i...

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Abstract

The invention relates to a lifting device of etching baking equipment. The device comprises a lifting mechanism (1), a tail gas collector (2) and a cylinder component (3), wherein the tail gas collector (2) is supported on the lifting mechanism (1) and is lifted between an up limit position and a down limit position with the lifting mechanism (1); and when the lifting mechanism (1) lifts the tail gas collector (2) to the up limit position, the cylinder component (3) is used for further lifting the tail gas collector (2) to realize sealing between the tail gas collector (2) and a reaction furnace of the etching baking equipment. According to the lifting device of etching baking equipment, after the tail gas collector is pushed against the pedestal of the reaction furnace, the tail gas collector is compactly sealed on the pedestal of the reaction furnace by extruding an O ring on the pedestal of the reaction furnace, so that the problem of poor sealing ability of the reaction furnace is solved, and a beneficial technical effect is achieved.

Description

technical field [0001] The present invention relates to a lifting device for etching and baking equipment, more specifically, to a lifting device used in chlorine gas or chloride etching and baking equipment. Background technique [0002] Metal Organic Chemical Vapor Deposition (MOCVD for short) conducts chemical deposition reactions on substrates by means of thermal decomposition reactions to grow thin-layer single crystal materials of various III-V, II-VI compound semiconductors and their multiple solid solutions. The graphite disk is used as a supporting platform for the substrate, and excess chemical reaction residues will be deposited on the surface of the graphite disk during the reaction. If these residues are not removed, it will affect the corresponding temperature control and surface particles during the growth process of a new batch of epitaxial wafers, and finally affect the yield of epitaxial wafer growth. [0003] The graphite disk cleaning devices currently a...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F27D3/12
Inventor 丁云鑫徐小明周永君毛棋斌
Owner HANGZHOU SILAN AZURE