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Array substrate, manufacturing method thereof and displaying device

The technology of an array substrate and a manufacturing method is applied in the field of an array substrate and its manufacturing method and a display device, and can solve problems such as a large number of Mask processes, a high cost of a liquid crystal display, and an inability to improve production efficiency, so as to reduce the Mask process and reduce the cost effect

Active Publication Date: 2015-04-22
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the large number of mask processes required by the existing ADS mode array substrate manufacturing method, the cost of liquid crystal displays based on ADS technology is relatively high, and the production efficiency cannot be improved.

Method used

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  • Array substrate, manufacturing method thereof and displaying device
  • Array substrate, manufacturing method thereof and displaying device
  • Array substrate, manufacturing method thereof and displaying device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0070] combine Figure 4 to Figure 12 As shown, the method for manufacturing an array substrate provided in this embodiment includes the following steps:

[0071] Step F1, depositing a first transparent conductive film on the substrate 301, and forming a pattern of the common electrode 303 through a patterning process;

[0072] In step F1, the above-mentioned substrate 301 may be a substrate substrate based on inorganic materials such as a glass substrate, a quartz substrate, or a substrate substrate using an organic material;

[0073] The material of the first layer of transparent conductive film may be indium tin oxide (ITO), indium zinc oxide (IZO, Indium Zinc Oxide) and the like.

[0074] Step F2, forming a gate metal thin film on the substrate on which the above pattern is formed, and forming a pattern of the gate electrode 302 through a patterning process;

[0075] Step F3, sequentially forming a gate insulating layer film, a semiconductor layer film, and a source-drai...

Embodiment 2

[0086] combine Figure 13 to Figure 18 As shown, the method for manufacturing an array substrate provided in this embodiment includes the following steps:

[0087] Step S1, forming a first layer of transparent conductive film on the substrate 401, using a mask plate of the first transparent conductive layer to form a pattern of the common electrode 403 through a patterning process;

[0088] In step S1, the above-mentioned substrate 301 may be a substrate substrate based on inorganic materials such as a glass substrate, a quartz substrate, or a substrate substrate using an organic material;

[0089] The material of the first transparent conductive film may be indium tin oxide (ITO), indium zinc oxide (IZO, Indium Zinc Oxide) and the like.

[0090] Step S2, forming a gate metal thin film on the substrate 401 with the above pattern formed, and using a gate mask to form a pattern of the gate electrode 402 through a patterning process;

[0091] Step S3, sequentially form a gate i...

Embodiment 3

[0100] This embodiment introduces an array substrate, which is manufactured by using the method for manufacturing the array substrate in Embodiment 1 or 2.

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PUM

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Abstract

The invention discloses an array substrate, a manufacturing method of the array substrate and a displaying device and relates to the technical method of manufacturing the array substrate through four times of Masks. The manufacturing method of the array substrate comprises manufacturing processes of a public electrode layer, a gate metal layer, a semiconductor layer, a source leakage electrode layer, a passivation layer and a pixel electrode layer, wherein the passivation layer and the pixel electrode layer are manufactured through once image composition technology. The manufacturing method of the array substrate has the advantages of being capable of saving one time of use of the Masks and reducing production cost, and suitable for manufacturing the array substrate in an advanced super dimension switch (ADS) mode.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a manufacturing method thereof, and a display device. Background technique [0002] At present, display products are becoming more and more popular in people's daily life, and related display technologies are attracting more and more people's attention. The display field has broad market prospects, and has attracted a large number of enterprises and institutions to engage in research and development of display technology. [0003] The process of TFT-LCD (Thin Film Transistor-Liquid Crystal Display, Thin Film Transistor-Liquid Crystal Display) is complicated and the cost is high. Among them, the mask (mask plate) process is a test of the accuracy of equipment and processes. One more mask process will increase the production cost a lot, so it is very necessary to reduce the number of masks without affecting product performance. Since the invention of ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/77G02F1/136G03F7/00
Inventor 陈华斌王琳琳高英强袁剑峰
Owner BOE TECH GRP CO LTD