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Measuring circuit, measuring method and measuring device for TFT (thin film transistor) threshold voltage offset

A threshold voltage, measuring circuit technology, used in instruments, static indicators, etc., can solve the problems of long time period, TNP equipment occupancy, general test accuracy, etc.

Active Publication Date: 2013-05-22
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The value of the threshold voltage change is obtained by continuously applying voltage to the test sample. At this time, the TNP equipment is seriously occupied. Using a large-scale test equipment TNP, the time period is long, and the test accuracy is average.

Method used

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  • Measuring circuit, measuring method and measuring device for TFT (thin film transistor) threshold voltage offset
  • Measuring circuit, measuring method and measuring device for TFT (thin film transistor) threshold voltage offset
  • Measuring circuit, measuring method and measuring device for TFT (thin film transistor) threshold voltage offset

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Embodiment Construction

[0038] In order to make the technical problems, technical solutions and advantages to be solved by the present invention clearer, the following will describe in detail with reference to the drawings and specific embodiments.

[0039] Such as image 3 As shown, the embodiment of the present invention provides a threshold voltage offset measurement circuit 30 of a TFT, comprising: a first switch 31 for connecting a gate 321 of a thin film transistor (TFT) 32 and a power supply 34 (Vd); The second switch 33 is used to connect the source 322 of the thin film transistor 32 and the capacitor C1; one end of the capacitor C1 is connected to the second switch 31, and the other end is used to connect with the drain 323 of the thin film transistor 32; a control circuit (not shown in the figure), for controlling the first switch 31 to be in the closed state within the first predetermined time period T1, and the second switch 33 to be in the open state during the first predetermined time p...

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Abstract

The invention provides a measuring circuit, a measuring method and a measuring device for TFT (thin film transistor) threshold voltage offset. The measuring circuit comprises a first switch, a second switch, a capacitor and a control circuit. The first switch is connected with a grid electrode of a thin film transistor and a power supply of the thin film transistor. The second switch is connected with a source electrode of the thin film transistor and the capacitor of the thin film transistor. One end of the capacitor is connected with a drain electrode of the thin film transistor. The control circuit controls the first switch to stay in a connected state within a first preset period, the second switch to stay in a disconnected state within the first preset period, the first switch to stay in a disconnected state within a second preset period after the first preset period, and the second switch to stay in a connected state within the second preset period, so that the thin film transistor is driven to work to generate first threshold voltage. Operations of the first switch and the second switch performed within the first preset period and the second preset period are repeated to acquire second threshold voltage. The threshold voltage offset is acquired according to the first threshold voltage and the second threshold voltage. By the measuring circuit, the measuring method and the measuring device, timeliness and accuracy of measuring the threshold voltage offset of the thin film transistor are improved.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a measuring circuit, method and equipment for threshold voltage offset of TFT (Thin Film Transistor). Background technique [0002] The opening and closing of the thin film transistor (TFT) is controlled by the gate signal. When the thin film transistor is in the working state for a long time, the action of the gate bias will cause the electrical characteristics of the field effect transistor to become unstable, such as threshold voltage drift. In the design of thin-film transistors, it is necessary to predict their working life according to the short-term threshold voltage drift characteristics. In addition, in order to improve the manufacturing process of thin-film transistors, it is necessary to study the mechanism of threshold voltage drift of thin-film transistors under the action of gate bias. It is necessary to accurately measure the drift characteristics of the t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G09G3/00
Inventor 徐超张春芳魏燕金熙哲
Owner BOE TECH GRP CO LTD
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