Base isolation non-contact limit system
A non-contact, foundation isolation technology, which is applied in the protection of building foundation isolation devices and the field of foundation isolation non-contact limit systems, can solve the problems of shock, large deformation, and large contact stiffness of the isolation layer. To achieve the effect of preventing damage
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0017] Such as Figure 1-2 As shown, the basic shock-isolation non-contact limit system of the present invention, its specific implementation is as follows:
[0018] For the rubber bearing isolation structure, around the upper floor 8 of the isolation layer, set the reaction support 7 connected with the foundation, install the limit magnet II6 on the reaction support 7, install the limit magnet I5 On the floor 8 on the upper part of the shock-isolation layer, the N poles or S poles of the two magnets are opposite, leaving a reserved distance between them. Both the limit magnet I5 and the limit magnet II6 are electromagnets. When the upper floor 8 of the shock-isolation floor moves sideways, the sensor 1 collects the signal, and after the analysis system 2 calculates, the controller 3 sends an instruction to the power supply system 4, and the power supply system 4 supplies the limit magnet I5 and the limit magnet II6. With a specific current, the limit magnet I5 and limit mag...
Embodiment 2
[0021] This embodiment is similar to Embodiment 1, except that both the limit magnet I5 and the limit magnet II6 are limited to permanent magnets, and the sensor 1, the analysis system 2, the controller 3 and the power supply system 4 are not required at this time.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com