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A temperature control method and device for an anti-reflection film preparation furnace

A temperature control method and a technology of a temperature control device, which are applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of not being able to meet the optimal temperature of the anti-reflection film and the uniformity of the anti-reflection film.

Active Publication Date: 2016-12-14
JETION SOLAR HLDG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If all furnace tubes are produced at the same temperature, the optimal temperature required for each furnace tube to produce anti-reflection coatings cannot be met, resulting in low uniformity of the produced anti-reflection coatings

Method used

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  • A temperature control method and device for an anti-reflection film preparation furnace
  • A temperature control method and device for an anti-reflection film preparation furnace
  • A temperature control method and device for an anti-reflection film preparation furnace

Examples

Experimental program
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Effect test

Embodiment 1

[0023] see figure 1 , figure 1 A flowchart of a temperature control method for an anti-reflection film preparation furnace provided in Embodiment 1 of the present invention, as shown in figure 1 As shown, the method of this embodiment may include the following steps:

[0024] 101. Set a center temperature value correspondingly to several temperature zones pre-divided into each furnace tube.

[0025] Optionally, the anti-reflection film preparation furnace of the present invention can adopt the German centrotherm furnace.

[0026] Among them, since in the actual production process, the intake and exhaust gas of the furnace will cause a certain temperature difference between each furnace tube from the furnace mouth to the furnace tail, so each furnace tube of the anti-reflection film preparation furnace can be placed from the furnace mouth At the end of the furnace, several temperature zones are divided, and then the temperature of each temperature zone is controlled separate...

Embodiment 2

[0034] see figure 2 , figure 2 A flow chart of a temperature control method for an antireflection film preparation furnace provided in Embodiment 2 of the present invention, as shown in figure 2 As shown, the method of this embodiment may include the following steps:

[0035] 201. Divide each furnace tube into five temperature zones from the furnace mouth to the furnace tail.

[0036] In one embodiment, each furnace tube is divided into five temperature zones from the furnace mouth to the furnace tail, and each temperature zone is named as: LZ, CLZ, CZ, CGZ, GZ respectively from the furnace mouth to the furnace tail.

[0037] 202. Set a central temperature value corresponding to each temperature zone.

[0038] Wherein, considering the temperature requirements for preparing the anti-reflection film, the set central temperature value may range from 430°C to 465°C.

[0039] Since the intake and exhaust of the furnace tube will affect the temperature of the furnace tube, in...

Embodiment 3

[0058] see image 3 , image 3 A structural diagram of a temperature control device for an anti-reflection film preparation furnace provided in Embodiment 3 of the present invention, as shown in image 3 As shown, the device of this embodiment may include:

[0059] The first setting unit 301 is used to set a central temperature value correspondingly to several temperature zones pre-divided into each furnace tube;

[0060] The second setting unit 302 is used to set a fine-tuning temperature value for each temperature zone of each furnace tube, and the fine-tuning temperature value ranges from -10°C to 10°C;

[0061] The superposition unit 303 is configured to superimpose the central temperature value set by the first setting unit 301 and the corresponding fine-tuning temperature value set by the second setting unit 302 .

[0062] Please also refer to Figure 4 , Figure 4 A structural diagram of another temperature control device for an anti-reflection film preparation fur...

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Abstract

The embodiment of the present invention discloses a temperature control method and device for an anti-reflection film preparation furnace. Each furnace tube in the anti-reflection film preparation furnace is divided into several temperature zones. According to the physical structure and process characteristics of each furnace tube, Set a central temperature value for each temperature zone, and then set a fine-tuning temperature value corresponding to the central temperature value, and fine-tune the central temperature value of each temperature zone, so as to control the temperature of each furnace tube independently to ensure that each Each furnace tube is operated at the optimum temperature, which improves the uniformity of the reflective film.

Description

technical field [0001] The invention relates to temperature control technology, in particular to a temperature control method and device for an anti-reflection film preparation furnace. Background technique [0002] In the manufacturing process flow of crystalline silicon solar cells, the plasma enhanced chemical vapor deposition (PECVD, Plasma Enhanced Chemical Vapor Deposition) process is a very important process step. The PECVD process uses low-temperature plasma as an energy source, places the sample on the cathode of glow discharge under low pressure, uses glow discharge or an additional heating element to heat the sample to a predetermined temperature, and then mixes the heated sample with an appropriate amount of The reaction gas undergoes a series of chemical reactions and plasma reactions to form a solid anti-reflection film on the surface of the sample. [0003] When manufacturing solar cells, it is necessary to form an anti-reflection film with anti-reflection an...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67H01L21/205
Inventor 麻晓园
Owner JETION SOLAR HLDG