Acid-washing exhaust gas lead-out device for titanium metal tube

Abstract

The invention discloses an acid-washing exhaust gas lead-out device for a titanium metal tube, and belongs to the technical field of environmental protection facilities. The acid-washing exhaust gas lead-out device comprises an acid-washing groove, a cover plate used for covering the open part of the acid-washing groove, a gas collection groove, and a negative pressure suction mechanism used for leading the acid-washing exhaust gas to a purification device to perform purification treatment, wherein a group of acid-washing exhaust gas lead-out holes used for leading out an acid-washing exhaust gas in the acid-washing groove cavity of the acid-washing groove are formed in the groove wall at one side of the length direction of the acid-washing groove and located in the upper part of the groove wall in a spacing state; the cover plate is pivotedly arranged on the acid-washing groove; a part corresponding to the acid-washing exhaust gas lead-out holes, of the gas collection groove is fixed with the outer wall at one side of the length direction of the acid-washing groove, and the groove cavity of the gas collection groove is communicated with the acid-washing exhaust gas lead-out holes; and the negative pressure suction mechanism is connected with the gas collection groove in a matching manner, and communicated with the groove cavity of the gas collection groove. The acid-washing exhaust gas lead-out device has the following advantages that the influence of the acid-washing exhaust gas on a working environment and the harm thereof on the health of workers are avoided; an ideal exhaust gas collection effect is obtained; and the cost of the purification treatment is reduced.

Description

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AI Technical Summary

Benefits of technology

This technology helps protect workplace environments while reducing pollution caused by acidic or basic gases used for surface processing operations such as chemical vapor deposition (CVD). By providing a sealed chamber where there are no exhaustion fumes when operating with this process, the risk of contamination remains minimal even at high temperatures. Additionally, due to its close proximity to the wafer being processed, the system uses less expensive equipment than traditional systems without any extra steps needed after each step.

Problems solved by technology

This patented describes different methods for producing titania materials with improved environmental performance compared to traditional processes like hot water washing systems. However, current techniques have limitations due to their use opening containers where dangerous chemical substance may escape when exposed while being worked over without proper protection against exposure hazards. Additionally, they require frequent maintenance and disposal after each use, making them expensive and potentially causing contamination concerns.

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