Cleaning apparatus, equipment, and method

A technology for cleaning devices and cleaning liquids, which is applied to chemical instruments and methods, cleaning methods and utensils, cleaning methods using liquids, etc., and can solve the problems of complicated and expensive devices, inability to adjust ultrasonic exposure under cleaning conditions, etc.

Active Publication Date: 2013-07-31
SILTRONIC AG
View PDF4 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, the device disclosed in JP2009-231668 requires a mechanical structure in the cleaning tank to rotate the ultrasonic refracting element, and thus the device is complicated and expensive
In addition, although the device disclosed in JP2001-057354 allows the substrate to have a relatively large area of ​​the surface exposed to ultrasonic waves, this device cannot adjust the ultrasonic exposure in accordance with cleaning conditions, and it is therefore difficult to completely and completely expose the surface to ultrasonic waves.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cleaning apparatus, equipment, and method
  • Cleaning apparatus, equipment, and method
  • Cleaning apparatus, equipment, and method

Examples

Experimental program
Comparison scheme
Effect test

no. 1 example

[0052] will refer to figure 1 The basic structure of the cleaning device of the present invention will be described. Such as figure 1 As shown, the present invention provides a cleaning device 1 , which includes a cleaning tank 2 , a coupling tank 3 , an ultrasonic generating unit 6 and a changing unit 7 . The cleaning tank 2 holds a cleaning solution 4 for cleaning a substrate 10 as an object to be cleaned. The coupling tank 3 holds the intermediate medium 5 , and the cleaning tank 2 has a portion (a part of the side wall and the bottom) in contact with the intermediate medium 5 . The bottom of the cleaning tank 2 is inclined relative to the bottom of the coupling tank 3 . The ultrasonic generating unit 6 is arranged at the coupling tank 3 , and ultrasonically oscillates the cleaning liquid 4 via the intermediate medium 5 . The ultrasonic generating unit 6 is connected and thereby fixed to the bottom wall of the coupling groove 3 . The changing unit 7 changes the differe...

no. 2 example

[0069] refer to Figure 8 , the present invention provides a second embodiment of the cleaning device 1, as will be described below. Figure 8 The cleaning device 1 basically has a figure 2 The configuration of the cleaning device 1, except that the former has a corresponding modification unit 7 (see figure 1 ) that are constructed differently. specifically, Figure 8 The cleaning device 1 is provided with two systems of pipes which respectively supply the intermediate medium to the coupling tank 3 . In one system, the pipe 18 connected to the coupling tank 3 is connected to an automatic valve 27 which is connected via pipe 19 to a water supply (eg a sink). The automatic valve 27 is supplied with water through the pipe 19 as indicated by the arrow 32 . Furthermore, in another system, the pipe 18 connected to the coupling tank 3 has the automatic valve 28 connected thereto. In addition, an automatic valve 28 is connected to an ethanol supply source (eg, an ethanol tank) ...

no. 3 example

[0078] refer to Figure 10 , the third embodiment of the present invention provides a cleaning apparatus 100 as will be described below. Such as Figure 10 As shown, cleaning apparatus 100 includes three cleaning units 41-43 and a substrate transfer element (not shown). The cleaning unit 42 and the cleaning unit 43 are basically similar in construction to figure 1 The cleaning device 1 and includes a modification unit 7 connected to the coupling tank 3 . Change Unit 7 can have the figure 2 , Figure 7 and Figure 8 The configuration of the modified units of the shown cleaning device 1 corresponds. The cleaning unit 41 also has a substantially similar figure 1 The configuration of the cleaning device 1, except the former does not include the modification unit 7. Accordingly, in the cleaning unit 41 , ultrasonic waves travel through the cleaning tank 2 in a fixed direction as indicated by the arrow 15 .

[0079] In contrast, cleaning unit 42 and cleaning unit 43 are pr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A cleaning apparatus (1) includes a cleaning tank (2), a coupling tank (3), an ultrasonic wave generation unit (6), and a modification unit (7). The cleaning tank (2) holds a cleaning liquid (4) for cleaning a substrate (10) serving as an object to be cleaned. The coupling tank (3) holds an intermediate medium (5), and the cleaning tank (2) has a portion in contact with the intermediate medium (5). The ultrasonic wave generation unit (6) is provided at the coupling tank (3), and ultrasonically vibrates the cleaning liquid (4) via the intermediate medium (5). The modification unit (7) modifies a difference in sonic velocity between the cleaning liquid (4) and the intermediate medium (5).

Description

technical field [0001] The present invention relates to a cleaning device, an instrument and a method, and particularly relates to an ultrasonic cleaning device, an instrument and a method. Background technique [0002] Conventional known cleaning methods and apparatuses are used for immersing a substrate or the like in a cleaning solution and thereby exposing it to ultrasonic waves to clean it. In order to uniformly clean the entire surface of the object, this cleaning method requires exposing the entire surface to ultrasonic waves. However, ultrasonic waves are partially blocked by members in the washing tank that hold the washing liquid (for example, holding elements for holding an object), and thus the object has a surface that is not directly exposed to ultrasonic waves. In order to solve such problems, various techniques have been conventionally proposed. [0003] For example, Japanese Patent Publication No. 2009-231668 points out that a rotatable ultrasonic refracti...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B08B3/12B08B3/10
CPCB08B3/12H01L21/302B08B3/10
Inventor 森良弘榛原照男久保悦子内部真佐志
Owner SILTRONIC AG
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap