Seam line optimization method based on long-span region extraction

A technology of area extraction and optimization method, which is applied in image analysis, instrumentation, graphics and image conversion, etc., can solve problems such as difficult seams, and achieve the effect of improving quality and maintaining integrity

Active Publication Date: 2013-08-14
WUHAN UNIV
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  • Application Information

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Problems solved by technology

Traditional seamline optimization methods are mostly directly based on differences in pixel brightness, color, or texture, and it is difficult to make seamlines effectively avoid obvious features such as buildings

Method used

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  • Seam line optimization method based on long-span region extraction
  • Seam line optimization method based on long-span region extraction
  • Seam line optimization method based on long-span region extraction

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Embodiment Construction

[0032] The present invention will be further described below in conjunction with the embodiments shown in the accompanying drawings.

[0033] In this embodiment, for digital orthophoto images, each seam line to be optimized with a known starting point and ending point is optimized, and the specific steps are as follows:

[0034] Step 1, calculating the difference of pixels in the overlapping area; including the following sub-steps,

[0035] Step 1.1, for the left and right digital orthophotos involved in the seamline to be optimized, calculate the overlapping area between the images (such as figure 1 , figure 2 shown);

[0036] Step 1.2, calculate the difference of pixels in the overlapping area;

[0037] Establish a two-dimensional matrix (cost matrix) according to the overlapping area, which is used to represent the difference of pixels in the overlapping area. The width and height of the matrix are the width and height of the bounding rectangle of the overlapping area; ...

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Abstract

The invention provides a seam line optimization method based on long-span region extraction, comprising the steps of calculating the difference of overlap region pixels; respectively carrying out image segmentation on images in left and right image overlap regions through selecting a proper partitioning algorithm, determining the preferential region of seam lines from the segmentation results according to the span of segmentation regions, and optimizing a cost matrix according to the determined preferential region of the seam lines; and searching the optimized seam lines by adopting a Dijkstra algorithm according to the cost matrix and starting and ending points. The method is applicable to the optimizing process of the seam lines when a digital orthoimage is subjected to image mosaicking, the directions of the seam lines can be optimized, the optimized seam lines are along large-span regions such as roads, rivers and bare lands as far as possible, obvious surface features such as buildings are prevented from being passed through, the integrity of ground targets is kept, and therefore the quality of image mosaicking is improved.

Description

technical field [0001] The invention belongs to the field of photogrammetry and remote sensing image processing, in particular to a seamline optimization method based on large-span region extraction. Background technique [0002] Photogrammetry and remote sensing have opened up a new perspective for humans to understand the earth, and provided humans with new methods and means to understand the world from multi-dimensional perspectives and macro scales. As the most important basic data product of photogrammetry and remote sensing, digital orthophoto product is currently the most valuable digital product. Image mosaic is one of the key steps in generating digital orthophoto products. It is a process of splicing multiple digital orthophotos together to form a larger-scale image. It meets the needs of practical applications such as large-scale visualization, analysis, and processing in practical applications. [0003] Image mosaicking is usually carried out based on seamlines...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06T7/00G06T3/40
Inventor 潘俊周清华王密
Owner WUHAN UNIV
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