Three-freedom-degree precise regulating device based on ball location

A precision adjustment and ball positioning technology, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., can solve the problems of large space occupied by the motion pair, crawling phenomenon of the mechanism, gaps in the motion pair, etc., and achieve excellent dynamic performance , low cost, and the effect of meeting strict restrictions
CN103279013BInactive Publication Date: 2014-12-10ZHEJIANG UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
ZHEJIANG UNIV
Publication Date
2014-12-10
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a three-freedom-degree precise regulating device based on ball location. The device is installed between a main frame and an immersing unit of an immersed photo-etching machine; a mounting substrate and a connecting plate of the device are connected in parallel by three groups of same moving branched chains; each group of moving branched chain orderly consists of a linear moving pair, a ball fixing block, a ball and two guiding cylinders from the mounting substrate to the connecting plate; and two pre-tightening springs are respectively arranged at two sides of each group of moving branched chain. The three-freedom-degree precise regulating device disclosed by the invention is used for realizing installation and fixation of the immersing unit of the immersed photo-etching machine and precise regulation of a spatial posture of the immersing unit and realizing submicron-grade precise location of the immersing unit; the pre-tightening force of the pre-tightening springs ensures reliable contact between the ball and each guiding cylinder, so that the problems of existence of clearances and the creeping of the traditional moving pair in a micro-displacement range are solved; the structure connected in parallel enhances the rigidity of the system; and by the use of a modularized design, the three-freedom-degree precise regulating device can be used for three-freedom-degree precise regulation in places besides the immersed photo-etching machine.
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Description

technical field

[0001] The invention relates to a three-degree-of-freedom precision adjustment device, in particular to a three-degree-of-freedom precision adjustment device based on ball positioning. Background technique

[0002] As the core equipment for manufacturing VLSI, lithography plays a vital role in IC integration. Since the birth of the lithography machine, people have been working hard to improve the lithography resolution of the lithography machine. However, deep ultraviolet (DUV) dry lithography has reached its physical limit after the resolution spanned 45nm. Immersion lithography technology has become the mainstream technology breaking through the 45 nm node, which is of great significance to improve the resolution of lithography.

[0003] In an immersion lithography machine, it is required to fill an immersion flow field between the last projection objective lens and the silicon wafer. The immersion flow field is generated by the immersion unit, and in or...

Claims

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