Two-dimensional periodic V-shaped metal plasma resonance structure and method for manufacturing same

A plasmon resonance and periodic technology, applied in nanostructure manufacturing, single atom manipulation, Raman scattering, etc., can solve the problems of missing signals, sensitivity drop, small space ratio, etc., and achieve good repeatability, high electromagnetic field enhancement factor, The effect of high reliability

Inactive Publication Date: 2015-03-04
SOUTHEAST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the above-mentioned resonance-enhanced structure, the local field range with a high enhancement factor occupies a very small space ratio, so when the measured target molecule passes through the above-mentioned metal-enhanced structural unit, only a very small number of target molecules are detected through the enhanced field , and most of the target molecules are ignored, resulting in a sharp drop in sensitivity or even missing signals

Method used

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  • Two-dimensional periodic V-shaped metal plasma resonance structure and method for manufacturing same
  • Two-dimensional periodic V-shaped metal plasma resonance structure and method for manufacturing same
  • Two-dimensional periodic V-shaped metal plasma resonance structure and method for manufacturing same

Examples

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Effect test

Embodiment 1

[0031] A two-dimensional periodic V-shaped metal plasmon resonance structure, including a substrate (1) and a metal film (2); the substrate (1) is a crystalline silicon substrate in the shape of a V-shaped groove, and the bottom of the V-shaped groove There are slits, the crystal orientation of the upper surface of the crystalline silicon substrate is (100), the crystal orientation of the V-shaped groove slope of the crystalline silicon substrate is (111), and the slope angle of the V-shaped groove is 54.7°; The metal film (2) is a gold film or a silver film, and is arranged on the upper surface of the substrate (1) and in the V-shaped groove.

[0032] Among them, the thickness of the substrate (1) is on the order of microns, the thickness of the metal film (2) is about 75 nanometers, the size of the slit is 10 nanometers, and the structural period is on the order of microns.

[0033] Its preparation method comprises the following steps:

[0034] (1) After throwing a layer of...

Embodiment 2

[0040] A two-dimensional periodic V-shaped metal plasmon resonance structure, including a substrate (1) and a metal film (2); the substrate (1) is a crystalline silicon substrate in the shape of a V-shaped groove, and the bottom of the V-shaped groove There are slits, the crystal orientation of the upper surface of the crystalline silicon substrate is (100), the crystal orientation of the V-shaped groove slope of the crystalline silicon substrate is (111), and the slope angle of the V-shaped groove is 54.7°; The metal film (2) is a gold film or a silver film, and is arranged on the upper surface of the substrate (1) and in the V-shaped groove.

[0041] Among them, the thickness of the substrate (1) is on the order of microns, the thickness of the metal film (2) is about 50 nanometers, the size of the slit is 5 nanometers, and the structural period is on the order of microns.

[0042] Its preparation method comprises the following steps:

[0043] (1) After throwing a layer of ...

Embodiment 3

[0047] A two-dimensional periodic V-shaped metal plasmon resonance structure, including a substrate (1) and a metal film (2); the substrate (1) is a crystalline silicon substrate in the shape of a V-shaped groove, and the bottom of the V-shaped groove There are slits, the crystal orientation of the upper surface of the crystalline silicon substrate is (100), the crystal orientation of the V-shaped groove slope of the crystalline silicon substrate is (111), and the slope angle of the V-shaped groove is 54.7°; The metal film (2) is a gold film or a silver film, and is arranged on the upper surface of the substrate (1) and in the V-shaped groove.

[0048] Wherein, the thickness of the substrate (1) is on the order of microns, the thickness of the metal film (2) is about 100 nanometers, the size of the slit is 20 nanometers, and the structural period is on the order of microns.

[0049] Its preparation method comprises the following steps:

[0050] (1) After throwing a layer of p...

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Abstract

The invention provides a two-dimensional periodic V-shaped metal plasma resonance structure which comprises a substrate (1) and a metal film (2). The substrate (1) is in the shape of a V-shaped groove, and a slit is formed at the bottom of the V-shaped groove; the metal film (2) is arranged on the upper surface of the substrate (1) and is positioned in the V-shaped groove. The invention further provides a method for manufacturing the structure. The two-dimensional periodic V-shaped metal plasma resonance structure and the method have the advantages that the structure is extremely high in electromagnetic enhancement factor, target molecules can assuredly pass a resonance enhancement region of a local field when passing a detecting unit, and the high detecting sensitivity and high detecting precision are guaranteed.

Description

technical field [0001] The invention belongs to the field of detection equipment, and in particular relates to a two-dimensional periodic V-shaped metal plasmon resonance structure for ultra-high sensitivity and precise detection of gas molecules, and also relates to a preparation method of the structure. Background technique [0002] Raman scattering (RS) is a kind of scattering phenomenon of light. When the photon of the monochromatic incident light interacts with the molecule to be measured, an inelastic collision occurs, energy exchange occurs between the photon and the molecule, and the photon changes the direction and frequency of motion. Scattering occurs. Raman spectroscopy (RS) is known as the fingerprint of molecules, which can be used for structural analysis and has clear directivity. According to the fingerprint characteristics of Raman scattering, the Raman scattering technology without marking can directly identify gas molecules. [0003] However, due to the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/65B82B1/00B82B3/00
Inventor 吕昌贵祁正青王肇征毕纪军叶莉华钟嫄崔一平
Owner SOUTHEAST UNIV
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