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Substrate processing device and method

A technology of a substrate processing device and a substrate processing method, which is applied to valve devices, multi-port valves, engine components, etc., can solve problems such as the decrease in development uniformity, and achieve the effect of improving development uniformity.

Active Publication Date: 2013-10-23
SEMES CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, the uniformity of development in the edge region 12 of the substrate 10 decreases.

Method used

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  • Substrate processing device and method
  • Substrate processing device and method
  • Substrate processing device and method

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Embodiment Construction

[0048] Hereinafter, a substrate processing apparatus according to a preferred embodiment of the present invention will be described in detail with reference to the attached drawings. In describing the present invention, when it is judged that the specific description of related well-known configurations or functions is unclear to the gist of the present invention, the detailed description will be omitted.

[0049] In this embodiment, the substrate processing apparatus performs a developing step on the substrate 10 . However, the technical concept of the present invention is not limited thereto, and can be applied to various steps of supplying a treatment liquid onto the substrate 10 to form a film of the treatment liquid.

[0050]In addition, in this embodiment, the substrate 10 will be described by taking a rectangular substrate 10 used for manufacturing a display device as an example. However, the type of the substrate 10 is not limited thereto, and the substrate 10 may be ...

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Abstract

The invention provides a substrate processing device and a method capable of providing a film of treating fluid in a uniform thickness on a whole area of the substrate. The invention provides the device supplying treating liquid for the substrate and forming the film of the treating fluid on the substrate. The device is provided with a processing room executing substrate treatment, and the processing room is provided with a housing formed along an opening allowing the substrate to move in, and is provided with a gate mounting element for adjusting the opening width in a transverse direction of the opening. The gate mounting element is provided with gates arranged in a row in the transverse direction of the opening, and the gates are respectively driven.

Description

technical field [0001] The present invention relates to a substrate processing apparatus and method, and more specifically, relates to an apparatus and method for supplying a processing liquid to a substrate to process the substrate. Background technique [0002] Generally speaking, the manufacturing steps of flat panel displays require various steps such as evaporation steps, photographing steps, etching steps, and cleaning steps. Wherein, the photographing step is a step of forming a pattern with a photosensitive film on the substrate before the etching step. The photographic step consists of a coating step of largely coating a photosensitive film on a substrate, an exposure step of transferring a pattern formed with a mask to the photosensitive film, and selectively removing the light-irradiated area or the opposite area with the photosensitive film. The development step consists of. Among them, it is important to form a film of the developer solution with a uniform thi...

Claims

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Application Information

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IPC IPC(8): G03F7/30F16K11/10
Inventor 李晟熙刘同真
Owner SEMES CO LTD
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