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Method and apparatus for drying nanometer pattern by using microwave

A technology of microwave drying and nano-patterns, which is applied to microstructure devices, heating devices, drying, etc., can solve the problems of nano-pattern collapse, lodging or destruction, and achieve the effects of reducing mass use, protecting the environment and reducing consumption

Inactive Publication Date: 2013-12-04
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, when the pattern size reaches the technology node of 32nm and below, the above methods will inevitably cause the collapse, lodging or destruction of the nano-pattern

Method used

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  • Method and apparatus for drying nanometer pattern by using microwave

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Embodiment Construction

[0023] Such as figure 1 It can be seen that the device used to realize the drying process in the present invention includes: fluorescent lamp 2, microwave generator 3, magnetron 6, quartz cleaning box 10, turntable 8, rotating rod 13, motor 14 and power supply. Wherein, the fluorescent lamp 2 is connected with a power source and fixed inside the microwave resonant cavity 9 . The microwave generator 3 is connected with the power supply and fixed in the control panel box 12 . The output of the microwave generator 3 is connected with the magnetron 6, and the other end of the magnetron 6 is connected with the power supply. The quartz cleaning box 10 can be fixed on the turntable 8 . The motor 14 is connected with the turntable 8 through the rotating rod 13 . Among them, the fluorescent lamp 2 is preferably a yellow fluorescent lamp. In this embodiment, the microwave generator 3 is used to generate high-frequency microwaves. In this embodiment, the introduction of motors, rota...

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Abstract

The present invention relates to the technical field of semiconductor drying processes, and discloses a method and an apparatus for drying a nanometer pattern by using microwave. The method comprises: cleaning a nanometer sample sheet requiring a treatment; and carrying out a drying treatment on the cleaned nanometer sample sheet by using microwave. The apparatus comprises a fluorescent lamp, a microwave generator, a microwave resonance cavity, a magnetron, a quartz cleaning box, a rotation table, a frequency converter, a rotation rod, a motor and a power supply. According to the present invention, the problem of structure collapsing during a drying process can be effectively solved.

Description

technical field [0001] The invention relates to the technical field of semiconductor drying technology, in particular to a method and device for drying nanometer patterns by using microwaves. Background technique [0002] In the fabrication process of microelectronic devices, with the further reduction of feature size and the further increase of structure complexity, the collapse of nano-device structures has become an increasingly serious problem. Collapse is the phenomenon in which the surface tension of the solution pulls the compliant structure toward the substrate during the drying process, and when the drying process is complete, the structure and substrate are firmly adhered together. Structural collapse is one of the main causes of device failure. Excluding other factors, the drying process becomes a very critical step. After cleaning the device with water as the main solvent, in the traditional drying method, the part with weak mechanical structure and the photore...

Claims

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Application Information

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IPC IPC(8): B81C99/00F26B23/08
Inventor 王磊景玉鹏
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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