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Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes

A technology of plasma and processing chamber, applied in the field of plasma processing

Inactive Publication Date: 2013-12-25
NORDSON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Another challenge is to process the panels evenly in each of the different processing chambers

Method used

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  • Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes
  • Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes
  • Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes

Examples

Experimental program
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Embodiment Construction

[0025] References to like reference numerals denote like features figure 1 , 2 , 3A, 3B and 5, the plasma processing system 10 includes a cabinet or housing 12, a vacuum chamber 14, and an evacuable space 16 surrounded by side walls 13 of the vacuum chamber 14. Access to the evacuatable space 16 is via an access opening 18 in the vacuum chamber 14 . The door 15 can be opened to expose an access opening 18 through which the evacuable space 16 is accessible, and can be closed to provide a fluid-tight seal isolating the evacuable space 16 from the surrounding environment. The door 15 , attached near the access opening 18 by a hinge located along one side edge of the vacuum chamber 14 , has a latch 20 that engages another portion of the vacuum chamber 14 when the door 15 is in the closed position. The latch 20 is used to secure the chamber door 15 in sealing engagement with the remainder of the vacuum chamber 14 . A sealing member 22 around the perimeter of the door 15 is inter...

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Abstract

The invention provides multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes. Provided is an apparatus for treating products with plasma generated from a source gas. The apparatus includes a vacuum chamber, a plurality of juxtaposed electrodes arranged in adjacent pairs inside the vacuum chamber, and a plasma excitation source electrically coupled with the electrodes. The apparatus may include conductive members extending into the interior of each electrode to establish a respective electrical connection with the plasma excitation source. The apparatus may include a gas distribution manifold and multiple gas delivery tubes coupled with the gas distribution manifold. Each gas delivery tube has an injection port configured to inject the source gas between each adjacent pair of electrodes. The apparatus may further include flow restricting members that operate to partially obstruct a peripheral gap between each adjacent pair of electrodes, which restricts the escape of the source gas from the process chamber between each adjacent pair of electrodes.

Description

[0001] This application is a Chinese invention patent with an application date of May 20, 2009, application number 200910141105.8, and the title of the invention is "Multi-electrode plasma processing system with confined processing chamber and electrical connection to internal connections of the electrodes" Divisional application of the application. technical field [0002] The present invention relates generally to plasma processing, and in particular to plasma processing systems and methods for processing substrates with improved uniformity. Background technique [0003] Plasma treatment is frequently used to modify the surface properties of substrates used in a variety of applications including, but not limited to, integrated circuits, electronic packaging, and printed circuit boards. Specifically, plasma treatment can be used in electronic packaging, for example, to etch resin, remove smear, increase surface activation and / or surface cleanliness to eliminate delamination...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00H01L21/683H01L21/50H05H1/24
CPCH01J37/3244H01J37/32449H01J37/32568H01J37/32577H01L21/3065H01L21/76825H01J15/02
Inventor 托马斯·V·博尔登二世路易斯·费耶罗詹姆士·D·格蒂
Owner NORDSON CORP