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Gas analysis device and method

A technology of gas analysis and gas analyzer, which is applied in the direction of sampling device, analysis material, semiconductor/solid-state device testing/measurement, etc. It can solve the problems that the system cannot meet the test requirements and calibration requirements, and achieve the effect of ensuring the accuracy of the test

Active Publication Date: 2014-06-18
RAINBOW SOURCE LASER RSLASER
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Since the EUV lithography vacuum environment has extremely strict requirements on hydrocarbons and other components, there is currently no gas analysis device that can be directly used for EUV vacuum environment testing, and the existing system cannot meet the testing requirements and calibration requirements

Method used

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  • Gas analysis device and method

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Embodiment 1

[0042] Such as figure 1 As shown, this embodiment discloses a gas analysis device for analyzing the gas in the chamber to be measured, including: a sampling chamber 201, an analysis chamber 501, a gas analyzer 6, and a calibration module. The sampling chamber 201 is connected to the chamber to be tested 10 through the first valve 203, and is used to introduce the sample gas from the chamber to be tested 10 and the standard gas provided by the calibration module. Multiple chambers are tested separately in situ. The analysis chamber 501 is connected to the sampling chamber 201 through the second valve. The analysis chamber 501 is provided with a vacuum gauge 504 for monitoring the vacuum degree of the analysis chamber 501. The vacuum degree of the analysis chamber 501 should meet the working requirements of the gas analyzer 6, otherwise It will burn out the gas analyzer 6. The gas analyzer 6 is set in the analysis chamber 501 for analyzing and testing the gas to be analyzed; t...

Embodiment 2

[0064] like figure 2 As shown, the gas analysis method provided in this embodiment takes the dynamic calibration method as an example, and specifically includes the following steps:

[0065] S1, system maintenance;

[0066] The initial state of the gas analysis device is the maintenance state, filled with protective gas, and the valves are closed;

[0067] S2, shielding gas extraction;

[0068] Open the first pumping valve 505 between the analysis chamber 501 and the second pumping valve 202 between the sampling chamber 201 on the pump group, and the second valve (valve plate) between the analysis chamber 501 and the sampling chamber 201 502, 503), extract the protective gas in the analysis chamber 501 and the sampling chamber 201;

[0069] S3, baking;

[0070] The analysis chamber 501 and the sampling chamber 201 are baked and degassed by the heater 9 arranged on the analysis chamber 501 and the sampling chamber 201;

[0071] S4, calibration;

[0072] Treat that baking...

Embodiment 3

[0082] The gas analysis method provided in this embodiment takes the static calibration method as an example, and specifically includes the following steps:

[0083] S1, system maintenance;

[0084] The initial state of the gas analysis device is the maintenance state, filled with protective gas, and the valves are closed;

[0085] S2, shielding gas extraction;

[0086] Open the first pumping valve 505 between the analysis chamber 501 and the second pumping valve 202 between the sampling chamber 201 on the pump group, and the second valve (valve plate) between the analysis chamber 501 and the sampling chamber 201 502, 503), extract the protective gas in the analysis chamber 501 and the sampling chamber 201;;

[0087] S3, baking;

[0088] The analysis chamber 501 and the sampling chamber 201 are baked and degassed by the heater 9 arranged on the analysis chamber 501 and the sampling chamber 201;

[0089] S4, calibration;

[0090] After the baking program is finished, open ...

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Abstract

The invention provides a gas analysis device with an in-situ calibration function. The gas analysis device comprises a sampling chamber, an analysis chamber, a gas analyzer and a calibration module, wherein the sampling chamber is connected with a to-be-detected chamber through a first valve and used for leading in sample gas in the to-be-detected chamber; the analysis chamber is connected with the sampling chamber through a second valve, and a vacuum gauge tube is arranged on the analysis chamber and used for monitoring the degree of vacuum of the analysis chamber; the gas analyzer is arranged in the analysis chamber and used for analyzing and testing to-be-analyzed gas; the calibration module is used for providing standard gas for the gas analyzer and quantificationally calibrating the gas analysis device. The invention further provides a gas analysis method. According to the invention, the gas analysis device is periodically calibrated through the calibration module, bakeout degassing is performed through a heater, gas sweeping and protective gas filling are performed through a sweeping and degassing module, a system is enabled to maintain favorable testing background, testing accuracy is guaranteed, gas strength testing at the level of part per billion can be realized, and the gas analysis device is especially suitable for gas analysis and detection in EUV vacuum environment.

Description

technical field [0001] The invention relates to the technical field of gas analysis, in particular to a gas analysis device and method with an in-situ calibration function. Background technique [0002] A lithographic apparatus is a machine that transfers the desired pattern onto a substrate. In lithographic apparatus, hydrocarbon-containing contamination gases emanating from substrates can damage optical components. Especially in EUV lithography devices, since all known substances have a strong absorption effect on EUV light near 13.5nm, it is necessary to minimize its loss on the transmission path. Especially for the optical components inside the lithography apparatus, the contamination by the polluted gas may cause irreparable damage, and huge costs will be paid for maintenance. In order to prevent this kind of damage, it is necessary to equip the lithography equipment with a gas analysis device to detect such gas contamination, monitor the vacuum environment of extreme...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N35/00G01N35/10G01N1/22G01N1/28H01L21/66
Inventor 宗明成徐天伟黄有为马向红魏志国
Owner RAINBOW SOURCE LASER RSLASER
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