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Apparatus and methods for self-regulating processing systems

A technology for processing systems and equipment, applied in the direction of control/regulation systems, general control systems, mechanical equipment, etc., can solve the problems of vacuum system performance loss, long recovery time, inaccurate recovery time, etc.

Active Publication Date: 2015-12-02
EDWARDS LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, after many operating cycles, there may be a loss of performance of the vacuum system, and thus the time required for the vacuum pump to return from idle mode to normal operating mode becomes longer than the initial set point
Preset recovery times may become inaccurate for a certain period of time as conventional methods are not adaptable to the changing conditions of the processing system

Method used

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  • Apparatus and methods for self-regulating processing systems
  • Apparatus and methods for self-regulating processing systems
  • Apparatus and methods for self-regulating processing systems

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Embodiment Construction

[0016] The present invention is directed to a method and apparatus for adjusting the recovery time of a processing system from an idle mode to a normal operating mode in order to improve resource utilization efficiency. The processing system may be a system for semiconductor manufacturing and includes processing tools supported by auxiliary devices such as vacuum pumps or abatement devices. A number of parameters can be controlled to adjust the recovery time of the assistive device. At the end of each recovery cycle, one or more of those parameters may be increased or decreased based on a comparison between the measured actual recovery time and a predetermined target recovery time. Thus, the actual measured recovery time can gradually converge with the predetermined target recovery time, thereby optimizing the resource utilization of the processing system.

[0017] figure 1 A processing system 100 is shown in which the disclosed methods and apparatus may be implemented accor...

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PUM

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Abstract

Disclosed herein is a method and apparatus for automatically adjusting the recovery time of a processing system from an idle mode to a normal operating mode in order to improve resource utilization (eg, energy consumption) efficiency. The processing system may be a system for semiconductor manufacturing and includes processing tools supported by auxiliary devices such as vacuum pumps or abatement devices. A number of parameters can be controlled to adjust the recovery time of the auxiliary device. At the end of each recovery cycle, one or more of those parameters may be increased or decreased based on a comparison between the measured actual recovery time and a predetermined target recovery time. Thus, the actual measured recovery time may gradually converge with the predetermined target recovery time, thereby optimizing the resource utilization of the processing system.

Description

technical field [0001] The present invention generally relates to apparatus and methods for self-regulating a processing system in order to improve the efficiency of resource utilization (eg, energy consumption) of the processing system. Background technique [0002] Processing systems for fabricating semiconductor devices typically include processing tools, vacuum pumps, and removal devices, among others. The processing tool provides a processing chamber in which the semiconductor wafer is processed into a predetermined structure. For example, chemical vapor deposition may be performed to form an oxide layer on a semiconductor wafer in a processing chamber. In another example, the processing tool may include a processing chamber in which the oxide layer is also etched into a predetermined pattern. In operation, the process chamber needs to be under vacuum conditions to ensure that semiconductor processing steps are not compromised by the presence of unwanted chemicals or ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05B19/042
CPCG05B2219/45031G05B19/41865Y02P90/02F04D19/04F04D27/02G05B13/021G05D7/06G05D13/02H01L21/02H01L21/67005G05B19/042G05B13/00H02P1/04
Inventor G.R.舍利
Owner EDWARDS LTD