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Photovoltaic EVA film resisting PID

A photovoltaic, mass fraction technology, applied in the direction of film/sheet adhesives, adhesive additives, non-polymer adhesive additives, etc., can solve the lack of consistency and durability of anti-PID performance, general anti-PID performance and other problems, to achieve the effect of long-lasting and stable anti-PID performance, long-lasting anti-PID performance, and eliminating PID problems

Active Publication Date: 2014-01-22
CSI SOLAR POWER GROUP CO LTD +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these EVA films have strong selectivity to the cells, and they tend to have better anti-PID performance for this batch of cells, and general or even poor anti-PID performance for the next batch of cells, lacking consistency in anti-PID performance. sex and persistence

Method used

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  • Photovoltaic EVA film resisting PID
  • Photovoltaic EVA film resisting PID
  • Photovoltaic EVA film resisting PID

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] Described photovoltaic EVA film contains following composition by mass fraction:

[0043]

Embodiment 2

[0045] Described photovoltaic EVA film contains following composition by mass fraction:

[0046]

[0047]

Embodiment 3

[0049] Described photovoltaic EVA film contains following composition by mass fraction:

[0050]

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Abstract

The invention relates to a photovoltaic EVA film resisting PID. The photovoltaic EVA film resisting the PID comprises the following components, by mass fraction, 0.05-5% of cross-linking agents, 0.05-5% of assistant crosslinker agents, 0.2-10% of polyolefin ionomer, 0.1-5% of hydrophobing agents, normal additives and the balance EVA. The photovoltaic EVA film resisting the PID is low in cost and high in performance, has no selectivity on battery pieces, the PID resistance performance is lasting and stable, and the photovoltaic EVA film resisting the PID can pass the PID standard test of IEC, has identical lasting PID resistance performance in a photovoltaic system, thoroughly eradicates the PID problem of components in an EVA level, and meets the demands of current and future component markets.

Description

technical field [0001] The invention relates to an EVA film, in particular to a PID-resistant photovoltaic EVA film. Background technique [0002] PID (Potential Induced Degradation) is a potential potential induced decay, a characteristic of photovoltaic panels, and improper treatment will lead to a decrease in the power and efficiency of photovoltaic panels. In recent years, more and more customers have reported that the power generation of power plant components has decreased to varying degrees, which is lower than the expected value, and many of them have been confirmed to be caused by PID. At present, the PID phenomenon has been understood by more people, and more and more research institutions and component manufacturers have conducted in-depth research and published articles on it. [0003] In order to reduce the impact of PID, various efforts have been made at home and abroad. At the battery level, I have tried various changes above, such as changing the base resis...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09J7/00C09J123/08C09J11/08C09J11/06
Inventor 唐景彭丽霞傅冬华唐应堂
Owner CSI SOLAR POWER GROUP CO LTD
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