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Film-forming apparatus

A film-forming device and mounting surface technology, applied in vacuum evaporation plating, coating, discharge tube, etc., can solve the problem of film-forming performance degradation

Active Publication Date: 2014-03-12
CANON ANELVA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] When multiple targets of different materials used in film formation are selected in a specific order for sputter film formation, if contamination occurs between the targets, the film formation performance may decrease

Method used

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Examples

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no. 1 Embodiment ）

[0032] in accordance with Figure 1~6 A film forming apparatus according to a first embodiment of the present invention will be described. figure 1 is a vertical sectional view of the film forming apparatus according to the first embodiment of the present invention. The film-forming device 1 includes a vacuum container, a sputtering film-forming device in which four target electrodes 35-38 (36, 37 are not shown) are arranged inside the vacuum container 51, and also includes a substrate holder 3 for holding the substrate W and a A given target T is exposed to the shutter means 4 of the substrate W. The shutter device 4 is arranged at a position between the target T and the substrate W. As shown in FIG.

[0033] exist figure 1 Among them, the vacuum evacuation unit for making the inside of the film forming apparatus 1 into a required vacuum state, the unit for supplying electric power to the target electrodes 35 to 38 , and the substrate conveyance unit for exchanging the sub...

no. 2 Embodiment

[0066] in accordance with Figure 7A , 7B8. A film forming apparatus according to a second embodiment of the present invention will be described. Figure 7A is equivalent to passing image 3 The sectional view of the baffle device 54 of the I-I line, Figure 7B is equivalent to passing image 3 The sectional view of the baffle device 54 of the II-II line. Figure 8 It is a perspective view (oblique sectional view) including the baffle device 54 along a section corresponding to line II-II. The same symbols are assigned to the same members, arrangements, and the like as those in the first embodiment, and detailed description thereof will be omitted.

[0067] In the baffle device 54 of this embodiment, the separating part 82 including the convex part is provided on the first baffle (first baffle member) 65, and the separating part 81 (second convex part) including the U-shaped part is provided on the target. Electrode holder 61 side. The separation portion 82 including the...

no. 3 Embodiment ）

[0071] in accordance with Figure 9A , 9B A film forming apparatus according to a third embodiment of the present invention will be described. Figure 9A is equivalent to passing image 3 The sectional view of the baffle device 64 of the I-I line, Figure 9B is equivalent to passing image 3 The sectional view of the baffle device 64 of the II-II line. The same symbols are assigned to the same members, arrangements, and the like as those in the first embodiment, and detailed description thereof will be omitted. In the baffle device 64 of this embodiment, the cover body 75 is attached to some openings among the plurality of openings of the second baffle 67 .

[0072] When the second shutter 67 is raised relative to the first shutter 65 , the opening on the substrate holder side of the unused target T2 can be closed by the cover 75 . Therefore, particles flying from the space on the substrate holder side can be reduced from adhering to the target T2. According to this emb...

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PUM

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Abstract

This film-forming apparatus has: a plurality of target electrodes, each of which is provided with an attaching surface to which a target is to be attached; a substrate holder that holds the substrate at a position facing the target electrodes; a first shutter member, which is rotatably provided between the target electrodes and the substrate holder, and has a plurality of openings that face the attaching surfaces when rotated; a first separating section, which is disposed at an area between openings in the first shutter member, said area being on, out of the two first shutter member surfaces, the first shutter member surface on the target electrode side; and a second separating section, which is disposed at an area between the first shutter member and the target electrode. The first shutter member is driven so as to bring the first separating section and the second separating section close to each other such that a labyrinth is formed between the first separating section and the second separating section, and so as to separate the first separating section and the second separating section from each other such that the first shutter plate can be rotated.

Description

technical field [0001] The present invention relates to a film-forming apparatus, for example, specifically to pollution in a multi-target sputtering film-forming apparatus that has a plurality of target electrodes of different materials in a single chamber and forms a multi-layer film by sputtering using a rotary baffle device. prevention and reduction. Background technique [0002] In a multi-target sputtering film forming device (for example, Patent Document 1), the required multilayer film can be formed by continuous sputtering from the bottom layer to the top layer on the substrate without interruption in one film forming chamber. [0003] In order to perform sputtering film formation of a multilayer film, in the film formation apparatus of Patent Document 1, a plurality of targets of different materials are arranged in one chamber at the top of the chamber, in other words, above the substrate on which the film is formed. In the space, there is a baffle device for sele...

Claims

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Application Information

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IPC IPC(8): C23C14/34
CPCC23C14/34C23C14/505C23C14/564C23C14/3464H01J37/3441H01J37/3447
Inventor 梶原雄二安松保志小长和也
Owner CANON ANELVA CORP