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Settling reaction tank structure

A reaction tank and settling type technology, applied in the field of settling type reaction tank structure, can solve the problems of uneven flow field, insufficient liquid flow, low yield rate, etc. Effect

Inactive Publication Date: 2014-03-26
GRAND PLASTIC TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] However, in the above-mentioned existing sinking type reaction tank structure, most of the liquid 104 directly settles, resulting in an uneven flow field, so that the liquid flow on the surface of the workpiece 102 in the middle is insufficient, and the etching rate is lower than that on the surface of the workpiece 102 on the periphery. The result is Insufficient etching uniformity or incomplete cleaning, resulting in lower yield

Method used

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  • Settling reaction tank structure
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Embodiment Construction

[0041] see image 3 and Figure 4 , the present invention provides a sinking type reaction tank structure, which includes a reaction tank 1 and at least one liquid spray pipe 3, the reaction tank 1 is substantially the same as the prior art, and a plurality of workpieces 2 can be accommodated in the reaction tank 1, so The workpiece 2 can be processed such as etching or cleaning of a wafer, thinning of a glass plate, etc. These workpieces 2 are vertically inserted in the reaction tank 1 and properly positioned, because the positioning structure of the workpiece 2 is an existing technology, so it will not be described in detail.

[0042] The material of the liquid spray pipe 3 is not limited, the liquid spray pipe 3 is arranged above the reaction tank 1, and the liquid spray pipe 3 is provided with a plurality of spray holes 31, and the spray holes 31 can be spaced apart. The setting of the spray holes 31 is not limited, and can also be appropriately changed according to need...

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Abstract

The invention provides a settling reaction tank structure comprising a reaction tank, a liquid spray pipe, a pipeline and a pump, wherein the liquid spray pipe is arranged above the reaction tank, and the pipeline and the pump are connected between the reaction tank and the liquid spray pipe. Therefore, liquid can enter the reaction tank by spraying, so that the flow field uniformity of the settling reaction tank can be improved, and the etching uniformity or cleaning comprehensiveness is improved.

Description

technical field [0001] The invention relates to a sinking type reaction tank structure, in particular to a sinking type reaction tank structure used for processing such as etching or cleaning of wafers and thinning of glass plates. Background technique [0002] The existing sinking type reaction tank is used for processing such as etching or cleaning of wafers, thinning of glass plates, etc., and can be produced in batches to reduce costs. see figure 1 and figure 2 , the existing sedimentation reaction tank structure has a reaction tank 101, which can accommodate a plurality of workpieces 102 in the reaction tank 101, and a liquid supply tank 103 is arranged on the upper layer of the reaction tank 101, and supplies liquid 104 to the reaction tank from the periphery. The tank 101 allows the liquid 104 to settle from the surroundings of the reaction tank 101 to the bottom of the tank through the surface of the workpiece 102 . It is sent back to the liquid supply tank 103 b...

Claims

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Application Information

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IPC IPC(8): C03C15/00
Inventor 詹印丰颜锡鸿蔡汉平陈毓正余智林
Owner GRAND PLASTIC TECH