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Rotary sputter target assembly

A technology for sputtering targets and components, applied in the field of sputtering targets, can solve problems such as warping and detachment

Inactive Publication Date: 2014-05-07
PRAXAIR TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Can cause warping and eventual detachment

Method used

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  • Rotary sputter target assembly
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  • Rotary sputter target assembly

Examples

Experimental program
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Effect test

example 1

[0044] The rotating target assembly is fabricated in accordance with the principles of the present invention. The tubular target blank was formed from 5N pure aluminum. Approximately 50 rectangular shaped grooves were machined along the perimeter of the backing tube. The backing tube is then coaxially positioned within the inner diameter (ID) of the tubular target blank and co-drawn through the die. formed as figure 1 Slotted interface shown in . Approximately 50% to 100% of the slot space is filled with target material. The spacing between the grooves is about 5mm. The height of the slot is about .7mm. The width of the slot is 5mm. The rotating target assembly was then inserted into a rotating test rig to simulate sputtering conditions. The rotating test equipment utilized in the test was a cylindrical stainless steel vacuum chamber with an inner diameter of 10.25 inches and a height of 25 inches. After the rotating target assembly is installed in the vacuum chamber, ...

example 2

[0047] The rotating tubular target assembly was formed as described in Example 1. A portion of the assembly is cut to obtain a sample of the necessary size for bend testing. The sample had an outer diameter of 173 mm, an inner diameter of 125 mm and a length of 610 mm. The samples were bend tested by Westmoreland Mechanical Testing and Research, Inc., Youngstown, Pennsylvania. A schematic diagram of the test set up employed by Westmoreland is at Figure 7 shown in. This testing device is routinely employed in the industry to evaluate the strength and stiffness of materials. The sample target assembly 701 is positioned over two support pins 702 and 703 . Each of the support pins 702 and 703 has a diameter of 2 inches. Pins 702 and 703 are spaced a distance of 16 inches from each other as measured from the center of pin 702 to the center of pin 703 . like Figure 7 As shown, load mechanism 704 is positioned directly above the midpoint of pins 702 and 703. Load mechanism ...

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Abstract

This invention utilizes a co-extrusion or co-drawing process to directly bond a tubular target to an inner backing tube. The co-extrusion or co-drawing process reduces the inner and outer diameters of the outer tubular target to cause portions of the target to protrude and at least partially fill into grooves along the inner backing tube. The filling causes the target to interlock to the backing plate

Description

technical field [0001] The present invention generally relates to the field of sputter targets. In particular, embodiments of the present invention relate to improved rotary sputtering target assemblies in which the target is bonded directly to a backing tube by a co-drawing or co-extrusion process superior. Background technique [0002] Cathode sputtering is widely used to deposit thin sheets of conductive material onto a desired substrate. This process entails gas ion bombardment of a target formed of the desired material to be deposited as a thin film on the substrate. Ion bombardment of the surface of the target causes atoms or ions of the target material to be sputtered. The target forms part of a cathode assembly with an anode. The cathode assembly is placed in an evacuated chamber filled with an inert gas, preferably argon. A high voltage electric field is applied across the cathode and anode. The noble gas is ionized by collision with electrons ejected from the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34H01J37/34B21D39/04B21C37/15
CPCB21C37/154C23C14/3407H01J37/342H01J37/3435B21D41/04B21C37/151B21C1/24B21C23/24Y10T29/49117B21D39/04C23C14/34
Inventor S.S.G.蒂尔斯P.S.吉尔曼
Owner PRAXAIR TECH INC
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