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Picture composition device and method

A patterning and device pairing technology, applied in instruments, electrical components, optics, etc., can solve the problems of photoresist pattern damage, particle contamination, developer residue, etc., to improve uniformity, save costs, and avoid residue residues Effect

Active Publication Date: 2014-06-25
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the spraying method is easy to cause developer residue and particle contamination on the substrate, and at the same time, the impact force when spraying the developer may cause certain damage to the pattern of the photoresist

Method used

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  • Picture composition device and method
  • Picture composition device and method

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Embodiment Construction

[0029] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

[0030] As an aspect of the present invention, a patterning device is provided, such as Figure 1 to Figure 3 As shown, the patterning device may include a grabbing unit 10 and a processing liquid tank 20, wherein the processing liquid tank 20 is used to contain the processing liquid, and the grabbing unit 10 can be used to place the substrate 11 in the processing liquid tank 20, and , the grabbing unit 10 can remove the substrate 11 treated with the processing liquid from the processing liquid tank 20 .

[0031] In the prior art, the corresponding patterning process (such as developing or etching) is usually carried out on the substrate by spraying the treatmen...

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Abstract

The invention provides a picture composition device which comprises a grabbing unit and a treating fluid groove. The treating fluid groove is used for containing treating fluid, and the grabbing unit is used for placing substrates in the treating fluid groove and moving the treated substrates out of the treating fluid groove. Correspondingly, the invention further provides a picture composition method which is used for correspondingly treating the substrates through the picture composition device. By means of the picture composition device and method, homogeneity of material reaction of the treating fluid and the substrates can be improved, and damage of the existing spraying mode on pictures on the substrates can be avoided.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a patterning device and a patterning method. Background technique [0002] In the field of semiconductor and display device manufacturing, the photoresist is usually developed by spraying the developer, that is, the developer is sprayed on the substrate to peel off or dissolve the exposed (or unexposed) photoresist. [0003] However, the spraying method is likely to cause developer residue and particle contamination on the substrate, and at the same time, the impact force when spraying the developer may cause certain damage to the pattern of the photoresist. Contents of the invention [0004] In view of this, the object of the present invention is to provide a patterning device that can avoid damage to graphics during the patterning process. [0005] To achieve the above object, the present invention provides a patterning device, the patterning device includes a gripp...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027H01L21/306H01L21/683
CPCH01L21/67063H01L21/6715G02F1/1303H01L21/67086H01L21/67
Inventor 马群张琨鹏刘晓那徐长健
Owner BOE TECH GRP CO LTD