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A method of making a multi-cavity etalon

A production method and etalon technology, applied in the field of optics, can solve problems such as difficulties in production schemes, achieve the effects of large steepness, wide passband bandwidth, and reduced processing costs

Active Publication Date: 2016-05-11
SHANGHAI BRANCH FUZHOU GAOYI COMM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This is very difficult for the production scheme of purely cold working to achieve thickness control, and it is even more challenging for the processing of multi-cavity etalons

Method used

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  • A method of making a multi-cavity etalon
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  • A method of making a multi-cavity etalon

Examples

Experimental program
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Effect test

Embodiment 1

[0021] Such as figure 1 As shown, the double-cavity etalon includes a solid cavity 102 and an air cavity 107. 101, 103, and 106 are reflective films with certain reflectivity. 105 is a fused silica flat sheet, 108 is a spacer block, and 104 is an air-filled hole. In the process of processing, cold working is adopted, and the spacer block 108 is roughly processed to the designed thickness and then glued together with the solid cavity 102 with light glue or deepened light glue, and the fused quartz flat plate 105 is glued with the spacer block 108 with light glue or deepened light glue, A double-chamber etalon is formed. Then test the transmission peak of the double-chamber etalon. If the measured transmission peak deviates from the design value, then inject a certain pressure of nitrogen into the air chamber 107 through the air hole 104 to make the transmission peak of the double-chamber etalon consistent with the design value. , and finally the air hole is sealed to complete...

Embodiment 2

[0024] Such as figure 2 As shown, the three-chamber etalon includes a first air cavity 216 , a second air cavity 214 and a third air cavity 212 . Wherein 201, 204, 207, 210 are fused quartz flat plates, 213, 215, 217 are spacer blocks, 202, 205, 208, 211 are reflective films with a certain reflectivity, and 203, 206, 209 are air-filled holes respectively.

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Abstract

The invention discloses a manufacturing method of a multi-cavity etalon. The manufacturing method comprises the following steps: designing a structure of a multi-cavity etalon, determining the filtering characteristic, reducing one cavity each time and determining the filtering characteristic until the last cavity, and determining the filtering characteristic; and carrying out processing on each cavity one by one based on the filtering adjustment method to design the multi-cavity etalon. According to the scheme, the manufacturing method has the following beneficial effects: a problem that each cavity transmitting peak of a multi-cavity etalon is difficult to be controlled according to the traditional cold processing can be solved and the processing cost is lowered. The manufactured multi-cavity etalon has the wide passband width; the steepness between the pass band and the non-pass band unit is high; the transmitting peak has the flatness characteristic. Therefore, the special application of the etalon can be well realized.

Description

technical field [0001] The invention relates to the field of optics, in particular to a method for manufacturing a multi-cavity etalon. Background technique [0002] The etalon is a comb-shaped filter optical element, and its main technical indicators include: free spectral range, transmission peak, fineness, etc. In the fields of optics and optical communication, standards are widely used. [0003] The wave locker is a device used to lock the wavelength of the laser, and its core component is the etalon. The general principle of this application is as follows: under normal circumstances, the output wavelength of the laser coincides with the transmission peak of the etalon, and the laser is output from the laser, passes through the etalon, and then reaches the application end. At this time, the ratio of the optical power output by the laser from the laser to the optical power after passing through the etalon is in a minimum state. When the output wavelength of the laser d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/28
Inventor 吴砺张新汉潘忠灵胡豪成林磊
Owner SHANGHAI BRANCH FUZHOU GAOYI COMM CO LTD
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