Furnace tube cleaning process

Abstract

The invention provides a furnace tube cleaning process which comprises a step of using vinylidene chloride to clean a furnace tube and also comprises a step of using a temperature-increasing wet oxygen process to clean the furnace tube, wherein in the temperature-increasing wet oxygen process, water vapour is used for carrying away metal pollutants inside the furnace tube; the temperature-increasing wet oxygen process comprises steps of temperature increment, stabilization and temperature reduction; the step of temperature increment is used for increasing the temperature of the furnace tube to a first temperature, and then forming steam after oxyhydrogen is led in for ignition; the step of stabilization is used for maintaining the first temperature of the furnace tube for a period of time and forming steam after oxyhydrogen is led in for ignition; the step of temperature reduction is used for lowering the temperature of the furnace tube from the first temperature to a second temperature and forming steam after oxyhydrogen is led in for ignition. According to the furnace tube cleaning process provided by the invention, a vinylidene chloride process and the temperature-increasing wet oxygen process are respectively used for cleaning the furnace tube, and the metal pollutants in the furnace tube are lowered to a great extent.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a furnace tube cleaning process. Background technique [0002] With the development of semiconductor device technology and higher device performance requirements, metal pollution is particularly critical to the semiconductor process. Metal pollution will affect the reliability of semiconductor devices, gate oxide breakdown voltage, and overall gate oxide integrity. key parameter. [0003] Using traditional furnace equipment (furnace) for furnace tube processing can process 125 pieces of products at a time. Therefore, furnace tube equipment has the advantages of large production capacity and low process cost, which is particularly important for reducing semiconductor operating costs. [0004] However, most of the current furnace tube equipment uses the inner and outer tubes of quartz products and crystal boats of quartz products, which have the advantages of simple structu...

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Problems solved by technology

[0004] However, most of the current furnace tube equipment uses the inner and outer tubes of quartz products and crystal boats of quartz products, which have the advantages of simple structure and relatively low price, but at the same time, some polluting elements are indispensable in the quartz manufacturing process, including copper and iron. and other metal pollution, and traditional furnace tube equipment is mostly used in high-temperature process technology, the diffusion of metal elements in quartz materials under high temperature conditions will lead to high levels of metal pollution on the machine

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