Combined type dot matrix image mark and manufacturing method thereof

A technology of a dot matrix image and a manufacturing method, which is applied in the field of anti-counterfeiting signs, can solve the problems of waste of resources, damage to the dot matrix image, and the dot matrix image logo does not have a protective layer of the mark, and achieves the effect of overcoming a single style.
CN104269101AInactive Publication Date: 2015-01-07LEADER TECH BEIJING DIGITAL TECH
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
LEADER TECH BEIJING DIGITAL TECH
Publication Date
2015-01-07
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention provides a combined type dot matrix image mark which comprises a mark body and a protecting light-transmitting film arranged at the top surface of the mark body in a covered mode. The mark body is formed by at least two layers of light-transmitting films with dot matrix image unit groups implanted in sequence in an overlapped mode. The positions of the dot matrix image unit groups implanted in different light-transmitting films are different. Each dot matrix image unit group comprises at least one image dot. At least two dot matrix image unit groups are combined to form complete dot matrix images. A method for manufacturing the combined type dot matrix image mark comprises the steps that the generated dot matrix images are divided into dot matrix image unit groups with the same number as the light-transmitting films; the dot matrix image unit groups are implanted into the corresponding light-transmitting films according to the positions in the dot matrix images; and the light-transmitting films with the dot matrix image unit groups implanted are overlapped, so that the combined type dot matrix image mark is formed. The combined type dot matrix image mark has the advantages of diversification, image dots at the top layer can be protected, and the problem that the image dots are damaged to form incomplete dots is avoided.
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Description

technical field

[0001] The invention relates to the field of anti-counterfeiting marks, and is characterized by a dot-matrix image mark, in particular a composite dot-matrix image mark and a manufacturing method thereof. Background technique

[0002] At present, the existing dot-matrix image logos are all set on the same plane, and their form is relatively simple; in addition, because the top surface of the existing dot-matrix image logos does not have a logo protection layer, therefore, the ink is implanted on the label The dot matrix image on the dot matrix image is easy to be damaged inadvertently, so that the complete image points in the dot matrix image logo become unrecognizable residual points, resulting in a waste of resources. Contents of the invention

[0003] Aiming at the deficiencies in the above-mentioned problems, the present invention provides a composite dot-matrix image mark and a manufacturing method thereof that can avoid damage to dot-matrix images in ...

Claims

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