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Positioning system, lithographic apparatus and device manufacturing method

A technology of lithography equipment and positioning system, applied in the field of manufacturing devices, can solve problems such as equipment downtime, time-consuming, and affecting equipment productivity

Active Publication Date: 2015-02-11
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Often, this calibration can be time consuming and can result in significant downtime of the equipment, thus adversely affecting the productivity of the equipment

Method used

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  • Positioning system, lithographic apparatus and device manufacturing method
  • Positioning system, lithographic apparatus and device manufacturing method
  • Positioning system, lithographic apparatus and device manufacturing method

Examples

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Embodiment Construction

[0021] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically shown. The equipment includes an illumination system (illuminator) IL configured to adjust a radiation beam B (such as UV radiation or any other suitable radiation), configured to support a patterning device (such as a mask) MA and connected to a configuration that is configured according to certain The support structure of the first positioning device PM of the patterning device or the support structure of the patterning device (for example, a mask operating table) MT is accurately positioned by parameters. The apparatus also includes a substrate handling table (for example, a wafer handling table) WT or a substrate holder configured to hold a substrate (for example, a resist coated wafer) W. The substrate handling table WT is connected to a second positioning device PW configured to accurately position the substrate according to certain parameters. The apparatus fur...

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Abstract

There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system comprises a support (210), a position measurement device, a deformation sensor (250; DS) and a processor (PU). The support is constructed to hold the object. The position measurement device configured to measure a position of the support. The position measurement device comprises at least one position sensor target (100.1, 100.2, 100.3) and a plurality of position sensors (200.1, 200.2; SA) to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal (S) representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.

Description

[0001] Cross references to related applications [0002] This application claims the benefits of U.S. Provisional Application No. 61 / 660,471 filed on June 15, 2012, and the application is hereby incorporated by reference in its entirety. Technical field [0003] The invention relates to a positioning system, a lithographic equipment and a method for manufacturing a device. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. Lithographic equipment can be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device, which is alternatively referred to as a mask or a reticle, can be used to generate a circuit pattern to be formed on a single layer of the IC. The pattern can be transferred to a target portion (e.g., a portion including one or several dies) on a substrate (e.g., a silicon wafer). The transfer of the pattern is usually...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70775G03F7/70783
Inventor R·A·C·M·比伦斯A·B·热因克M·M·J·范德瓦尔W·H·T·M·安格南特R·H·A·范莱肖特H·M·J·范德格罗伊斯S·W·范德霍伊文
Owner ASML NETHERLANDS BV
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