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A Chip-Integrated 2-micron Wavelength Microlaser

A micro-laser and wavelength technology, applied in lasers, laser parts, phonon exciters, etc., can solve the problem that no one has developed a micro-laser, and achieve the effect of optimizing the energy mode volume, low threshold and excellent quality

Active Publication Date: 2017-12-01
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, no one has developed a chip-integrated micro-laser in the 2-micron waveband so far.

Method used

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  • A Chip-Integrated 2-micron Wavelength Microlaser
  • A Chip-Integrated 2-micron Wavelength Microlaser
  • A Chip-Integrated 2-micron Wavelength Microlaser

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0039] The preparation process of the 2 micron wavelength laser of the present invention is as follows:

[0040](1) First prepare a rare earth-doped silicon oxide film by sol-gel method, the film thickness is 1 micron to 2 microns; (2) After photolithography, wet etching and dry etching, the silicon oxide microdisk cavity is obtained (3) Use a carbon dioxide laser to heat and reflow the silicon oxide microdisk cavity, wherein the power of the carbon dioxide laser is 7-10W, and the heating and reflow treatment time is 25-35 seconds, and the silicon oxide microdisk cavity is melted into a silicon oxide microring core cavity. Specifically, using a carbon dioxide laser to heat and reflow the silicon oxide microdisk includes the following steps: first, irradiate the surface of the silicon oxide microdisk cavity with a first power laser for 10-15 seconds to obtain a silicon oxide microring core cavity in an initial state, Then irradiate the surface of the initial state microring co...

Embodiment 1

[0042] A doped silicon oxide film with a thickness of 1.35 microns was obtained by the sol-gel method, in which the concentrations of doped thulium ions were 1×10 19 cm -3 , 2×10 19 cm -3 , 4×10 19 cm -3 . After photolithography, wet etching and dry etching, a silicon oxide microdisk cavity is obtained. A silicon oxide microring core cavity is obtained after the silicon oxide microdisk cavity is heated and reflowed by a carbon dioxide laser. On the other hand, ordinary single-mode optical fibers are drawn into micro-nano optical fibers with a diameter of 1 micron to 2 microns by high-temperature drawing method. Then put the silicon oxide microring core cavity on the three-dimensional piezoelectric console, precisely control its position, slowly bring the two closer together, and at the same time, input the adjustable continuous pump light in the 1.6 micron band from the A end of the fiber. When the micro-nano fiber and the micro-ring core resonator are at the optimal...

Embodiment 2

[0044] A doped silicon oxide film with a thickness of 1.35 microns was obtained by the sol-gel method, in which the concentrations of doped thulium ions were 2.6×10 19 cm -3 , 3.3×10 19 cm -3 , 4×10 19 cm -3 , the concentration of doped holmium ions is 5×10 18 cm -3 . The concentration ratios of thulium ions and holmium ions are 5.2, 6.6, and 8, respectively. Thulium-holmium co-doped silicon oxide micro-ring core cavity is obtained after photolithography, etching and carbon dioxide laser reflow process. At the same time, micro-nano optical fibers with a diameter of 1 micron to 2 microns are produced by high-temperature stretching. Then precisely control the coupling between the silica micro-ring core cavity and the micro-nano fiber, and at the same time, input the adjustable continuous pump light in the 1.6 micron wavelength band from the A end of the fiber. With the increase of the pump light power, the rare earth ions will produce fluorescence. At the same time...

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Abstract

The invention discloses a chip-integrated micro-laser with a wavelength of 2 microns, which comprises a rare-earth-doped silicon oxide micro-ring core cavity and a micro-nano fiber, wherein the micro-nano fiber is on one side of the silicon oxide micro-ring core cavity, and the oxide The silicon microring core cavity is prepared by the following methods: (1) preparing a rare earth-doped silicon oxide film on the surface of a silicon wafer by the sol-gel method; (2) using photolithography and etching processes on the surface of the silicon oxide film A silicon oxide microdisk cavity is prepared; (3) a carbon dioxide laser is used to heat and reflow the silicon oxide microdisk cavity to obtain a silicon oxide microring core cavity. The 2-micron wavelength micro-laser prepared by the sol-gel rare earth doping method of the present invention has the characteristics of chip integration, miniaturization, stability, and low threshold, and the energy mode volume in the cavity can be optimized through the power and time of carbon dioxide laser reflow , to obtain a laser with better quality.

Description

technical field [0001] The invention belongs to the field of micro-nano optical devices, and in particular relates to a 2-micron-wavelength micro-laser prepared by using a sol-gel rare earth doping method. Background technique [0002] Lasers with a wavelength of 2 microns are within the spectral range of human eye safety, can be widely used in laser surgery, and have unique advantages in laser sensing, material processing, and space communication. In addition, micro lasers are very important integrated optical and electronic components, and have broad application prospects in optical integrated circuits, information processing, and biosensing. Nowadays, silicon oxide microdisk cavity or microring core cavity can be well prepared using mature integration process. At the same time, the coupling of micro-nano fiber and micro-disk cavity or micro-ring core cavity to prepare lasers has become a very popular research subject, and the micro-ring core cavity laser has the advantag...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01S3/16H01S3/083
Inventor 姜校顺范会博丁杨肖敏
Owner NANJING UNIV
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