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Chip-integrated 2-micrometer wavelength micro laser

A micro-laser, laser technology, applied in lasers, laser parts, phonon exciters, etc., can solve the problem that no one has developed a micro-laser, and achieve the effect of optimizing the energy mode volume, low threshold and high quality

Active Publication Date: 2015-03-25
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, no one has developed a chip-integrated micro-laser in the 2-micron waveband so far.

Method used

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  • Chip-integrated 2-micrometer wavelength micro laser
  • Chip-integrated 2-micrometer wavelength micro laser
  • Chip-integrated 2-micrometer wavelength micro laser

Examples

Experimental program
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preparation example Construction

[0039] The preparation process of the 2 micron wavelength laser of the present invention is as follows:

[0040] (1) Firstly, prepare rare earth-doped silicon oxide film by sol-gel method, the film thickness is 1 micron ~ 2 micron; (2) After using photolithography, wet etching and dry etching, the silicon oxide microdisk cavity is obtained (3) Use a carbon dioxide laser to heat and reflow the silicon oxide microdisk cavity, where the power of the carbon dioxide laser is 7-10W, and the heating and reflow treatment time is 25 to 35 seconds to melt the silicon oxide microdisk cavity into silicon oxide microrings Core cavity. Specifically, using a carbon dioxide laser to heat and reflow the silicon oxide microdisk includes the following steps: first irradiate the surface of the silicon oxide microdisk cavity with a first power laser for 10-15 seconds to obtain an initial state silicon oxide microring core cavity, Then the surface of the initial state microring core cavity is irradia...

Embodiment 1

[0042] A doped silicon oxide film with a thickness of 1.35 microns was obtained by the sol-gel method, and the concentration of thulium ions was 1×10. 19 cm -3 , 2×10 19 cm -3 , 4×10 19 cm -3 . After photolithography, wet etching and dry etching, a silicon oxide microdisc cavity is obtained. A carbon dioxide laser is used to heat and reflow the silicon oxide microdisk cavity to obtain a silicon oxide microring core cavity. On the other hand, the high-temperature drawing method is used to draw ordinary single-mode optical fibers into micro-nano optical fibers with a diameter of 1 to 2 microns. Then put the silicon oxide microring core cavity on the three-dimensional piezoelectric console, precisely control its position, slowly bring the two closer together, and input the adjustable continuous pump light of the 1.6 micron band from the fiber end A. When the micro-nano fiber and the micro-ring core cavity are at the best coupling point, the energy will be absorbed by the micro...

Embodiment 2

[0044] A doped silicon oxide film with a thickness of 1.35 microns was obtained by the sol-gel method, in which the concentration of thulium ions was 2.6×10 19 cm -3 , 3.3×10 19 cm -3 , 4×10 19 cm -3 , The concentration of holmium ion doped is 5×10 18 cm -3 . The concentration ratio of thulium ion and holmium ion is 5.2, 6.6, and 8, respectively. Then through photolithography, etching and carbon dioxide laser reflow process, a thulium-holmium co-doped silicon oxide microring core cavity is obtained. At the same time, a micro-nano fiber with a diameter of 1 μm to 2 μm is prepared by the high-temperature drawing method. Then the coupling between the silicon oxide micro-ring core cavity and the micro-nano fiber is precisely controlled, and at the same time, the adjustable continuous pump light in the 1.6 micron band is input from the fiber A end. As the power of the pump light increases, rare earth ions will produce fluorescence. At the same time, thulium ions will absorb th...

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Abstract

The invention discloses a chip-integrated 2-micrometer wavelength micro laser. The chip-integrated 2-micrometer wavelength micro laser comprises a rare earth doping monox micro ring core cavity and a micro-nano fiber, wherein the micro-nano fiber is located on one side of the monox micro ring core cavity. The monox micro ring core cavity is prepared through the following steps that (1) a rare earth doping monox film is prepared on the surface of a silicon wafer through a sol-gel method; (2) a monox micro disc cavity is prepared on the surface of the monox film through a photoetching process and an etching process; (3) heating reflux treatment is carried out on the monox micro disc cavity through a carbon dioxide laser to obtain the monox micro ring core cavity. The 2-micrometer wavelength micro laser prepared through the sol-gel rare earth doping method has the advantages of being integrated in chip, micro, stable, low in threshold and the like, the energy mode volume in the cavity can be optimized according to the carbon dioxide laser reflux power and time, and a laser with a higher quality is obtained.

Description

technical field [0001] The invention belongs to the field of micro-nano optical devices, and in particular relates to a 2-micron-wavelength micro-laser prepared by using a sol-gel rare earth doping method. Background technique [0002] Lasers with a wavelength of 2 microns are within the spectral range of human eye safety, can be widely used in laser surgery, and have unique advantages in laser sensing, material processing, and space communication. In addition, micro lasers are very important integrated optical and electronic components, and have broad application prospects in optical integrated circuits, information processing, and biosensing. Nowadays, silicon oxide microdisk cavity or microring core cavity can be well prepared using mature integration process. At the same time, the coupling of micro-nano fiber and micro-disk cavity or micro-ring core cavity to prepare lasers has become a very popular research subject, and the micro-ring core cavity laser has the advantag...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/16H01S3/083
Inventor 姜校顺范会博丁杨肖敏
Owner NANJING UNIV
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