Substrate heating device and process chamber
A heating device and processing chamber technology, applied in the field of processing chambers, can solve the problems of inability to process multiple substrates at the same time, low mass production capacity of processing substrates, etc., and achieve the effects of minimizing the proportion of space occupied and uniform film quality characteristics
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[0032] The embodiments of the present invention will be described in more detail below with reference to the drawings, but the present invention is not limited to the embodiments disclosed below, and can realize various shapes different from each other. This embodiment is only a more complete disclosure of the present invention, and is for Provided to inform those skilled in the art of the scope of the present invention, the same symbols in the drawings refer to the same elements.
[0033] figure 2 is an external perspective view of a processing chamber according to an embodiment of the present invention. image 3 is an exploded view of a processing chamber according to an embodiment of the invention. Figure 4 is a cross-sectional view illustrating ascent or descent of a processing chamber according to an embodiment of the present invention. Figure 5 According to an embodiment of the present invention, it illustrates a diagram of raising a wafer boat in stages according t...
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