Piping to prevent residual liquid from dripping

Abstract

The invention discloses a pipeline for preventing residual liquid from dripping. The pipeline comprises a liquid supply pipeline, a sleeve and a vacuumizing device. The liquid supply pipeline is provided with a liquid inlet and a liquid outlet and sleeved with the sleeve. A gap is formed between the inner wall of the sleeve and the outer wall of the liquid supply pipeline. The liquid inlet of the liquid supply pipeline extends out of the end of the sleeve. The end of the sleeve is connected with the liquid supply pipeline in a sealed mode. The liquid outlet of the liquid supply pipeline is located in the sleeve. A certain distance is formed between the liquid outlet of the liquid supply pipeline and the pipe opening of the sleeve. The vacuumizing device is communicated with the sleeve and vacuumizes the sleeve. By means of the pipeline, residual liquid in the liquid supply pipeline can be sucked away from the gap between the inner wall of the sleeve and the outer wall of the liquid supply pipeline before dripping out of the pipe opening of the sleeve by vacuumizing the sleeve, and the residual liquid in the liquid supply pipeline is prevented from dripping.

Description

technical field [0001] The invention relates to a solution supply device, in particular to a pipeline for preventing residual liquid from dripping. Background technique [0002] In the manufacturing process of semiconductor devices, various solutions (such as deionized water, various chemical liquids, etc.) are usually used to treat the surface of the wafer. Such as figure 2 As shown, it is a schematic structural diagram of an existing solution supply device, which includes a solution supply pipeline 101 and a pneumatic valve 102 arranged on the solution supply pipeline 101 . When supplying the solution, open the pneumatic valve 102, the solution enters the solution supply pipeline 101 from the liquid inlet of the solution supply pipeline 101, and then flows out to the wafer surface from the liquid outlet of the solution supply pipeline 101 to treat the wafer surface. After the wafer processing is finished, the solution supply is stopped and the pneumatic valve 102 is clos...

AI Technical Summary

Problems solved by technology

However, once the residual liquid drop leaves the liquid filling channel mouth, the liquid drop cannot be sucked from the liquid suction port of the vacuuming channel because the liquid suction port of the vacuum channel and the filling liquid channel port of the perfusion nozzle are parallel to each other. Walk

Therefore, there is still a risk of liquid dripping from the device

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