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Parallel alignment platform based on flexible parallelogram mechanism and provided with remote rotating center

A parallelogram and platform technology, applied in manipulators, manufacturing tools, program-controlled manipulators, etc., can solve problems such as unsatisfactory system performance, increase, and limitation

Active Publication Date: 2015-05-20
电科北方数字科技(山东)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the driving radius of the trapezoidal mechanism is limited by the size of the mechanism itself, when a large operating space needs to be provided, the driving radius will increase accordingly. drive, the output angle of the mechanism will be reduced, which cannot meet the requirements of system performance

Method used

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  • Parallel alignment platform based on flexible parallelogram mechanism and provided with remote rotating center
  • Parallel alignment platform based on flexible parallelogram mechanism and provided with remote rotating center
  • Parallel alignment platform based on flexible parallelogram mechanism and provided with remote rotating center

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Embodiment Construction

[0068] The present invention will be further described in detail below in conjunction with the accompanying drawings.

[0069] see figure 1 , Figure 1A , Figure 1B , Figure 1C , Figure 1D , Figure 1E As shown, the present invention designs a parallel alignment platform with a remote center of rotation based on a flexible parallelogram mechanism. The parallel alignment platform includes a base 1, a pre-tightening screw 2, a motion transmission mechanism 3, a cover plate 4, Piezoelectric ceramic driver 5, A spacer 6A, B spacer 6B, platform backing plate 7, as well as brackets and capacitive sensors for installing sensors.

[0070] The parallel alignment platform designed by the present invention can amplify the input displacement through the double-lever amplification mechanism in the motion transmission mechanism 3, and transmit it to the external RCM guide mechanism, and finally complete the parallel alignment around the remote motion center.

[0071] (1) Base 1

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Abstract

The invention discloses a parallel alignment platform based on a flexible parallelogram mechanism and provided with a remote rotating center. The parallel alignment platform comprises a base, a pre-tightening screw, a capacitive sensor, a sensor support, a cover plate, a platform base plate, a movement transmission mechanism, a piezoelectric ceramic driver and a gasket. The cover plate, the movement transmission mechanism, the platform base plate and the base are arranged in the thickness direction. The base and the movement transmission mechanism are fixedly installed through a screw. The pre-tightening screw is installed on the cover plate and makes contact with the gasket. The piezoelectric ceramic driver and the gasket are installed between the movement transmission mechanism and the platform base plate. According to the designed parallel alignment platform, through a dual-lever amplifying mechanism and a dual-parallelogram guide mechanism in the movement transmission mechanism, the parallel alignment function of rotation around a remote center can be achieved.

Description

technical field [0001] The present invention relates to a parallel alignment device, more particularly, to a parallel alignment platform with a remote center of rotation based on a flexible parallelogram mechanism. Background technique [0002] In the field of micro-nano manipulation, such as fiber assembly, nanoimprinting, and optical component alignment, it is essential to achieve high-precision parallel alignment between two manipulation planes. The parallel alignment process requires the parallel alignment equipment to perform out-of-plane rotational adjustments to eliminate parallel errors between the two operating planes. Compared with traditional parallel alignment equipment, parallel alignment equipment with a remote center of motion (remote-center-of-motion, RCM) can rotate around a point far away from the alignment mechanism itself during the alignment process, thereby eliminating the need for The parasitic error along the horizontal direction generated at its end...

Claims

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Application Information

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IPC IPC(8): B25J9/00
Inventor 陈伟海屈见亮张建斌陈文杰
Owner 电科北方数字科技(山东)有限公司
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