Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A Parallel Alignment Platform with a Remote Center of Rotation Based on a Flexible Parallelogram Mechanism

A parallelogram and platform technology, applied in manipulators, manufacturing tools, program-controlled manipulators, etc., can solve problems such as unsatisfactory system performance, reduced and limited output angles of mechanisms, etc.

Active Publication Date: 2016-03-16
电科北方数字科技(山东)有限公司
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the driving radius of the trapezoidal mechanism is limited by the size of the mechanism itself, when a large operating space needs to be provided, the driving radius will also increase accordingly. If a driver with a small stroke such as piezoelectric ceramics (PZT) is used , the output angle of the mechanism will decrease, which cannot meet the requirements of system performance

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A Parallel Alignment Platform with a Remote Center of Rotation Based on a Flexible Parallelogram Mechanism
  • A Parallel Alignment Platform with a Remote Center of Rotation Based on a Flexible Parallelogram Mechanism
  • A Parallel Alignment Platform with a Remote Center of Rotation Based on a Flexible Parallelogram Mechanism

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0069] The present invention will be further described in detail below in conjunction with the accompanying drawings.

[0070] see figure 1 , Figure 1A , Figure 1B , Figure 1C , Figure 1D , Figure 1E As shown, the present invention designs a parallel alignment platform with a remote center of rotation based on a flexible parallelogram mechanism. The parallel alignment platform includes a base 1, a pre-tightening screw 2, a motion transmission mechanism 3, a cover plate 4, Piezoelectric ceramic driver 5, A spacer 6A, B spacer 6B, platform backing plate 7, as well as brackets and capacitive sensors for installing sensors.

[0071] The parallel alignment platform designed by the present invention can amplify the input displacement through the double-lever amplification mechanism in the motion transmission mechanism 3, and transmit it to the external RCM guide mechanism, and finally complete the parallel alignment around the remote motion center.

[0072] (1) Base 1

...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a parallel alignment platform based on a flexible parallelogram mechanism and provided with a remote rotating center. The parallel alignment platform comprises a base, a pre-tightening screw, a capacitive sensor, a sensor support, a cover plate, a platform base plate, a movement transmission mechanism, a piezoelectric ceramic driver and a gasket. The cover plate, the movement transmission mechanism, the platform base plate and the base are arranged in the thickness direction. The base and the movement transmission mechanism are fixedly installed through a screw. The pre-tightening screw is installed on the cover plate and makes contact with the gasket. The piezoelectric ceramic driver and the gasket are installed between the movement transmission mechanism and the platform base plate. According to the designed parallel alignment platform, through a dual-lever amplifying mechanism and a dual-parallelogram guide mechanism in the movement transmission mechanism, the parallel alignment function of rotation around a remote center can be achieved.

Description

technical field [0001] The present invention relates to a parallel alignment device, more particularly, to a parallel alignment platform with a remote center of rotation based on a flexible parallelogram mechanism. Background technique [0002] In the field of micro-nano manipulation, such as fiber assembly, nanoimprinting, and optical component alignment, it is essential to achieve high-precision parallel alignment between two manipulation planes. The parallel alignment process requires the parallel alignment equipment to perform out-of-plane rotational adjustments to eliminate parallel errors between the two operating planes. Compared with traditional parallel alignment equipment, parallel alignment equipment with a remote center of motion (remote-center-of-motion, RCM) can rotate around a point far away from the alignment mechanism itself during the alignment process, thereby eliminating the need for The parasitic error along the horizontal direction generated at its end...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B25J9/00
Inventor 陈伟海屈见亮张建斌陈文杰
Owner 电科北方数字科技(山东)有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com