Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Bessel light beam generating device with adjustable parameters and production method of bessel beam generating device

A technology of Bessel beam and generating device, which is applied in the field of particle light manipulation and optical testing, and achieves the effects of real-time online adjustment of parameters, simple principle and low cost

Inactive Publication Date: 2015-05-20
HENAN UNIV OF SCI & TECH
View PDF3 Cites 23 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] It can be seen from the analysis that in the existing technology for generating Bessel beams, there is still a lack of a real-time online adjustable generation device and method for Bessel beam parameters

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Bessel light beam generating device with adjustable parameters and production method of bessel beam generating device
  • Bessel light beam generating device with adjustable parameters and production method of bessel beam generating device
  • Bessel light beam generating device with adjustable parameters and production method of bessel beam generating device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] Below in conjunction with example the present invention will be further described.

[0034] As shown in the accompanying drawings, a parameter-adjustable Bessel beam generating device includes a continuous wave laser 100. In this embodiment, the continuous wave laser 100 selects a laser with a wavelength of 632.8nm and a power of 1mW; the continuous wave laser The light beam emitted by 100 is reflected by the total reflection mirror 110 and then enters the filter 120. A pinhole filter can be selected, and then collimated by the convex lens 130. beam cube 150 on;

[0035] The light beam after passing through the beam splitting cube 150 is divided into two beams, one is reflected light and the other is transmitted light; the reflected light is irradiated on the reflective spatial light modulator 200, and vortices are generated after being reflected by the reflective spatial light modulator 200 The beam, the vortex beam passes through the beam splitting cube 150 and the a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a bessel light beam generating device with adjustable parameters and a production method of the bessel light beam generating device. The bessel light beam generating device comprises a continuous wave laser device, wherein a light beam emitted from the continuous wave laser device is reflected by a total reflective mirror, enters a filter, and then is collimated by a convex lens; the collimated light beam passes through a polarizer, becomes into a linearly polarized light and irradiates on a beam-splitting cube; a reflected light which passes through the cube irradiates on a reflected spatial light modulator, is reflected by the reflected spatial light modulator and then generates a vortex light beam; the vortex light beam passes through the beam-splitting cube and a polarization analyzer, and then irradiates on the diaphragm; the vortex light beam which passes through the light diaphragm vertically irradiates on a transmission-type spatial light modulator, passes through the transmission-type spatial light modulator and then generates a bessel light beam; the bessel light beam is imaged in a CCD (charge coupled device) camera, and is stored in a computer, so as to be analyzed. The device disclosed by the invention has the advantages of concise principle and low cost; the parameters can be subjected to real-time online adjustment; the device can be widely applied to the fields such as particle light control and optical test.

Description

technical field [0001] The invention relates to a Bessel beam generating device and a generating method, in particular to a Bessel beam generating device and a beam generating method whose parameters can be flexibly adjusted, which can be widely used in the fields of particle light manipulation, optical testing, etc. . Background technique [0002] Bessel beams are a special set of solutions to the scalar wave equation in free space, whose light field distribution has the form of a Bessel function of the first kind. In 1987, J. Durnin first proposed the non-diffraction characteristics of Bessel beams, and called Bessel beams non-diffraction beams. Bessel beams have important application prospects in the fields of micro-manufacturing, micro-nano optics, and optical tweezers, especially in the manipulation of ultracold particles. In reality, there is no light source that directly emits Bessel beams. Therefore, how to generate high-quality Bessel beams with adjustable paramet...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/09G02B27/46
CPCG02B27/0944G02B27/0955G02B27/46
Inventor 李新忠台玉萍杜凯王辉王静鸽甄志强李贺贺
Owner HENAN UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products