Curtain-like developing nozzle
A nozzle and curtain-like technology, applied in the field of developing processing equipment, can solve the problems of long waste, wasted time, uneconomical and difficult to increase production capacity, etc.
Inactive Publication Date: 2015-05-20
SHENYANG KINGSEMI CO LTD
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Problems solved by technology
Most of the development is immersion development, and most development nozzles need a large amount of developer or waste a long period of time to achieve the immersion of the effective area of the wafer, which is neither economical nor productive.
Traditional mist spraying requires the developer to be sprayed on the surface of the wafer through the nozzle under high pressure. The ideal development method is that the developer will be soaked in the wafer for a certain period of time, and the mist droplets sprayed on the surface require a large amount of Repeated spraying to soak the entire wafer, a waste of time
Although the columnar spin coating developer is shorter than the mist spraying in time, the developer waste is huge
Method used
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Embodiment Construction
[0016] The present invention will be further described below in conjunction with the accompanying drawings.
[0017] Such as figure 1 , figure 2 As shown, the present invention includes a nozzle body 1 and a nozzle cover 2, wherein the nozzle cover 2 is arranged above the nozzle body 1, and a section structure and a nozzle opening 8 forming a curtain-like spray are arranged between the nozzle body 1 and the nozzle cover 2 , the nozzle opening 8 is a strip structure and communicates with the cross-sectional structure, and the nozzle cover 2 is provided with a water inlet joint 4 communicating with the cross-sectional structure. The coverage of the liquid ejected from the nozzle opening 8 is greater than or equal to the diameter of the processed wafer.
[0018] The cross-sectional structure includes a water tank and an overflow part 7 , wherein the water tank is a U-shaped groove, and the U-shaped groove is arranged on the upper surface of the nozzle body 1 and communicates w...
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The invention relates to developing processing equipment for acquiring a photoresist figure on a semiconductor wafer, specifically to a curtain-like developing nozzle. The nozzle includes a nozzle body and a nozzle cover, wherein the nozzle cover is disposed above the nozzle body, a section structure and a nozzle opening for forming curtain-like sprinkling are arranged between the nozzle body and the nozzle cover, the nozzle opening is communicated with the section structure, and the nozzle cover is equipped with a water supply connector communicated with the section structure. The section structure comprises a water tank and an overflow part, wherein the water tank is arranged on the upper surface of the nozzle body and is communicated with the water supply connector on the nozzle cover. One side of the nozzle body's upper surface is provided with a slope, a gap is left between the slope and the nozzle cover to form the overflow part, and two ends of the overflow part are communicated with the water tank and the nozzle opening respectively. The contact distance between the nozzle and the wafer is very small, so that in a spray coating process, the wasted developing liquid can be adjusted to a small amount.
Description
technical field [0001] The invention relates to a development treatment device for obtaining a photoresist pattern on a semiconductor wafer, in particular to a curtain-shaped development nozzle. Background technique [0002] At present, the known developing unit is mainly composed of a developing arm, a top cleaning arm, a protection cup, a liquid discharge chamber, a centrifuge part and the like. The fixed developing nozzle on the developing arm is driven to the wafer (hereinafter referred to as the wafer) for development, and the fixed cleaning nozzle on the top cleaning arm is driven to the wafer for cleaning. [0003] According to different process requirements, developing nozzles are divided into different types such as mist and columnar. To accomplish the above functions, it is necessary to select a suitable nozzle fit according to the process requirements. Most of the development is immersion development, and most development nozzles need a large amount of developer...
Claims
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IPC IPC(8): G03F7/30B05B1/02
Inventor 魏猛胡延兵
Owner SHENYANG KINGSEMI CO LTD