Method and system for measuring critical dimensions
A key dimension and measurement system technology, applied in the direction of measuring devices, instruments, optical devices, etc., can solve problems such as equipment utilization rate decline, and achieve the effect of improving equipment utilization rate and equipment operation efficiency
Inactive Publication Date: 2018-05-29
BOE TECH GRP CO LTD +1
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Problems solved by technology
[0003] Aiming at the defects in the prior art, the present invention provides a critical dimension measurement method and system, which can solve the problem in the prior art that when the feature picture cannot be matched normally, the device’s operating rate will be seriously reduced due to the suspension of the device.
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[0045] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.
[0046] figure 1 It is a structural block diagram of a critical dimension measurement system in an embodiment of the present invention. see figure 1 , the system includes a first device 11 and a second device 12, wherein:
[0047] The above-mentioned first device 11 is used to sequentially photograph each substrate to be tested, and send a data ...
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The present invention provides a critical dimension measurement method and system, wherein the critical dimension measurement system includes a first device and a second device, the first device is used to sequentially photograph each substrate to be measured, and will include the photographed results The data packet identified with the substrate is sent to the second device; the second device is used to receive and store the data packet from the first device, and perform identification with the substrate in the data packet according to the shooting result in the data packet Corresponding to the measurement of the critical dimension of the substrate to be tested. Based on the above solution, the present invention can solve the problem in the prior art that when the feature picture cannot be matched normally, the equipment suspends the operation, which will lead to a serious decrease in the utilization rate of the equipment. Compared with the prior art in which the equipment stops running when the characteristic picture cannot be matched normally, the present invention can improve the equipment operation efficiency of critical dimension measurement and improve the utilization rate of the equipment.
Description
technical field [0001] The invention relates to the field of display technology, in particular to a method and system for measuring critical dimensions. Background technique [0002] In the field of TFT-LCD (Thin Film Transistor, thin film transistor; Liquid Crystal Display, liquid crystal display) manufacturing field, the monitoring of critical dimension (Critical Dimension, generally refers to the graphic line width or interval below 100um, which is the size value indicating the position of the graphic) Measurement is very important, and its size control will directly affect the performance of the entire display device. In the prior art, monitoring and measurement of critical dimensions is mainly realized by matching actual photographs with pre-stored feature pictures. However, in the existing monitoring and measuring equipment, the transmission and positioning, photo shooting, matching feature pictures, and key dimension measurement of each substrate to be tested need to...
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IPC IPC(8): G01B11/00
Inventor 刘明悬郭总杰刘正张治超张小祥陈曦
Owner BOE TECH GRP CO LTD