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Vapour-deposition device having mobile vapour-deposition source

A deposition equipment and deposition source technology, which is applied in gaseous chemical plating, ion implantation plating, coating, etc., can solve the problems of generating particles, difficult to form thin films, etc., and achieve the effect of minimizing the generation of particles

Inactive Publication Date: 2015-09-02
BMC +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, there is a problem that it is difficult to form a uniform thin film
In addition, there is the problem of particles being generated by the motion of the coating target

Method used

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  • Vapour-deposition device having mobile vapour-deposition source
  • Vapour-deposition device having mobile vapour-deposition source
  • Vapour-deposition device having mobile vapour-deposition source

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Embodiment Construction

[0024] Hereinafter, exemplary embodiments of the present disclosure will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily implement the inventive concepts. It should be noted, however, that the present disclosure is not limited to the exemplary embodiments but can be implemented in various other ways. In the drawings, some components that are not directly related to the description will be omitted to improve the clarity of the drawings, and like numerals refer to like components throughout the document.

[0025] Throughout the document, the term "on" used to designate the position of one element relative to another element includes the case where the one element is adjacent to the other element as well as the case where there are any other elements between the two components.

[0026] Throughout this document, the terms "comprising or comprising" and / or "having" are used in this document to denote one or more other ...

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Abstract

In a vapour-deposition device for vapour-depositing a thin film onto the surface of an object to be coated in a vacuum chamber, the vapour-deposition device comprises: a vapour-deposition source for supplying a substance for forming the thin film; a supply unit for supplying the vapour-deposition source with one or more of coolant water, a power source and process gas; and a mobile unit for moving the vapour-deposition source inside the vacuum chamber.

Description

technical field [0001] The invention relates to a deposition apparatus with a mobile deposition source. Background technique [0002] In manufacturing liquid crystal displays and organic light emitting displays, transparent electrodes, metal electrodes, insulating films, etc. are formed by a physical vapor deposition (PVD) method or a chemical vapor deposition (CVD) method such as a plasma enhanced chemical vapor deposition (PECVD) method. [0003] Conventional physical or chemical vapor deposition equipment uses a fixed deposition source and a moving or rotating coating target. Since the deposition source should be connected to various devices that need to be supplied with coolant, power supply, process gas, etc., it can only be presented in a fixed form. [0004] However, in the case of depositing a thin film on a coating target in a curved form by a deposition apparatus including a fixed deposition source, the distance between the surface of the coating target and the de...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C16/448
CPCC23C16/448C23C14/243C23C14/24
Inventor 洪性喆李万镐
Owner BMC