Sample preparation method for in-situ observation of material matrix/passivation film interface structure by tem
A technology of sample preparation and interface structure, which is applied in the preparation of test samples, instruments, scanning probe technology, etc., can solve the problems of complex operation and low success rate of focused ion beam sample preparation
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[0025] The invention provides a sample preparation method for EM in-situ observation of material matrix / passivation film interface structure, which comprises:
[0026] The first step is metallographic sample preparation;
[0027] The second step is thinning by ion sputtering;
[0028] The third step is to corrode the metal sample to obtain the sample.
[0029] The first step is further specifically to use wire cutting or other cutting methods to prepare a metal sheet that meets the size required by the TEM sample; put the metal material sample in a solvent, clean it, and perform rough grinding, fine grinding, and fine grinding on a metallographic pre-grinder. Grinding and polishing to obtain base metal samples.
[0030] The solvent used is acetone or ethanol.
[0031] The cleaning method adopts the ultrasonic cleaning method.
[0032] The second step is further specifically to reduce the thickness of the basic metal sample prepared in the first step to meet the requirement...
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