Coating device

A coating device and nozzle technology, which is applied to devices and coatings that apply liquid to the surface, can solve problems such as harming the physical and mental health of equipment operators, pollution of the slit coater, affecting the stable operation of the slit coater, etc. question

Active Publication Date: 2015-09-30
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the process of squeezing and cleaning the photoresist to the liquid receiving tank, the photoresist will splash
Due to the irritating smell of the photoresist, coupled with the splash of the photoresist, it will pollute the slit coater and its surrounding environment, affect the stable operation of the slit coater, and endanger the health of the equipment operator. physical and mental health

Method used

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Embodiment Construction

[0024] The present invention will be further described below in conjunction with accompanying drawing.

[0025] figure 1 The structure of the coating device 100 is shown. Such as figure 1 As shown, the coating device 100 includes a nozzle 1 , a receiving tray 2 and a deflector 3 arranged in the receiving tray 2 . During the production of electronic devices such as thin film transistors and color filters, the nozzle 1 is used to coat photoresist on, for example, a glass substrate. The receiving tray 2 is arranged under the nozzle 1, and can collect the photoresist ejected from the nozzle 1 during pre-discharging and the like. The deflector 3 is arranged along the longitudinal direction of the receiving tray 2 and can form a first angle α with the vertical for receiving the fluid ejected from the nozzle 1 .

[0026] Therefore, before coating the photoresist or during the process of photoresist transfer, it is necessary to carry out a pre-spraying extrusion cleaning (Purge) p...

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PUM

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Abstract

The invention proposes a coating device. The coating device comprises a nozzle, a bearing tray arranged below the nozzle, and a guide plate arranged in the bearing tray for receiving a fluid sprayed out from the nozzle, wherein the guide plate is arranged in the longitudinal direction of the bearing tray, and can form a first angle with the vertical direction. The coating device can reduce the fluid splashing possibility to guarantee stable operation and to reduce or prevent the pollution and harm to operators.

Description

technical field [0001] The invention relates to the technical field of panel production, in particular to a coating device. Background technique [0002] In the production process of some electronic devices, a photolithography process is required to realize pattern conversion. For example, in the field of liquid crystal display production technology, in the manufacturing process of TFT (thin film transistor) and color filter, photolithography process is required in order to realize pattern conversion. Before the photolithography process, a layer of photoresist needs to be coated on the glass substrate. [0003] Currently, coating photoresist is usually applied using a slot coater. Before using the slit coater to coat the photoresist or during the process of changing the photoresist line, the photoresist will be pre-ejected and squeezed to ensure that the subsequent coating is uniform and free of air bubbles. The photoresist squeezed out of the slit coater will be placed i...

Claims

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Application Information

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IPC IPC(8): B05C5/00B05C11/10
Inventor 孙杰姚江波
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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