Photomask for photo-alignment and photo-alignment method
A photo-alignment and photo-mask technology, which is applied in photo-alignment photo-mask and photo-alignment fields, can solve problems such as unevenness and MMG product spot display, and achieve the effect of avoiding mura problem and improving alignment effect.
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[0054] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0055] see Figure 8 , the present invention firstly provides a photomask for optical alignment, including a photomask body 2, a plurality of light-transmitting patterns arranged on the photomask body 2, and the plurality of light-transmitting patterns are arranged along the first direction DY one by one line arrangement.
[0056] The plurality of light-transmitting patterns are arranged along a second direction DX perpendicular to the first direction DY, and each light-transmitting pattern includes a non-overlapping area that does not overlap with an adjacent photomask when in use, and is located at the non-overlapping area respectively. Overlapping regions that overlap adjacent reticles when used on the left and right sides of the region. ...
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