Device for detecting and removing foreign matter in exposure machine and exposure machine

Abstract

The invention provides an exposure machine platform foreign object detection and removal device and an exposure machine. The foreign matter detection and removal device of the machine includes: a foreign matter detection unit, which includes: a foreign matter detection component, which is used to detect whether there are foreign particles on the exposure machine and determine its position; a grinding component, which is used to grind and remove the adhesion on the machine. foreign particles; the vacuum assembly is used to absorb the small foreign objects generated during the grinding process and the small foreign objects on the machine; the guide rail assembly is detachably connected with the foreign object detection assembly, the grinding assembly and the vacuum assembly for The three components are carried parallel to the plane of the exposure machine for horizontal positioning and movement; the lifting component is used to carry the three components for vertical positioning and movement perpendicular to the plane of the exposure machine. The present invention can not only quickly locate and completely remove granular foreign matter after mura is found in the production process; it can also perform comprehensive detection and foreign matter removal before production to prevent product defects caused by foreign matter on the machine itself.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display equipment, and more specifically, relates to an exposure machine platform foreign object detection and removal device and an exposure machine. Background technique [0002] In the exposure process of liquid crystal display equipment manufacturing, the cleanness of the exposure machine has a direct impact on product quality. When there are foreign particles on the exposure machine, it will affect the lamination between the glass substrate and the exposure machine. If the glass substrate is slightly lifted by the stubborn granular foreign matter formed on the exposure machine, after the subsequent exposure machine Exposure, during macroscopic detection, there will be abnormalities, and during microscopic detection, a near-circular-shaped spot can be detected at the corresponding position (this field is also called mura, derived from Japanese, むら, spot, and mura is spelled for its pron...

AI Technical Summary

Problems solved by technology

This process takes a long time, at least one hour or more, and the entry of personnel in the exposure machine may introduce new foreign matter and cause secondary pollution, which will also increase the probability of mask damage

Moreover, as to whether the foreign matter is cleared or not, the first is to judge with the naked eye, which is obviously not ideal; the second is to judge whether the circle Mura at the corresponding position disappears by adding a macro measurement. This process is relatively cumbersome.

And once the mura is still in production after cleaning (for example, because it was not cleaned or the secondary pollution caused by the cleaning process), it needs to be disassembled and cleaned again, which seriously affects the production efficiency

Based on the average production capacity of the existing technology, an exposure machine can expose about 90 glass substrates in one hour, and the production loss of manual detection and removal of foreign particles is very large

In addition, due to the extremely low efficiency of manually detecting foreign objects inch by inch on the exposure machine, it is difficult to implement. This method can only be passively removed after the occurrence of mura, and cannot prevent the occurrence of mura before production begins.

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