Planar positioning compensation method for motion platform system

Abstract

The invention provides a planar positioning compensation method for a motion platform system. The motion platform system comprises a motion platform and a measuring machine stand carrying out measurement on an object on the motion platform. The method comprises the steps of a, selecting a standard measuring instrument, and enabling the standard measuring instrument to move along with the motion platform, wherein the standard measuring instrument is provided with a plurality of precision equally spaced patterns; b, recognizing a recognition coordinate value of each pattern on the standard measuring tool in the motion platform by using a pattern recognition system on the measuring machine stand; c, fitting the pattern spacing and a modified coordinate value of each pattern according to the recognition coordinate values; and d, acquiring the compensation amount required at the position of each pattern according to a difference value between the modified coordinate value and the recognition coordinate value. A planar compensation table of the motion platform system provided by the invention can be carried out online, the axis orthogonality and the scale uniformity of the motion platform system can be compensated simultaneously, and further operating conditions can be updated on the basis of an original compensation table when the compensation amount changes.

Description

technical field [0001] The present invention generally relates to the technical field of tooling, and in particular to a plane positioning compensation method for a motion platform system used in fields such as precision measurement. Background technique [0002] Motion platforms are widely used in precision measurement and other fields. The object to be measured or operated is placed on the chuck of the motion platform, and the motion platform moves the object to the designated position under the traction of gas pressure or precision motor. Due to the principle of the motion platform, machinery, air flotation and other reasons, there is a slight difference between the final position of the motion platform and the position expected by the operator. This small difference will bring errors into subsequent measurements and operations. [0003] The motion platform system itself has two-dimensional compensation of the plane position, but the calibration is generally completed o...

AI Technical Summary

Problems solved by technology

[0003] The motion platform system itself has two-dimensional compensation of the plane position, but the calibration is generally completed offline (that is, not installed in the measuring machine). Compared with the online (that is, installed in the measuring machine), the operating environment (mainly changes in temperature and humidity) have a large difference, which does not reflect the axis orthogonality

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