Unlock instant, AI-driven research and patent intelligence for your innovation.

Miniature etching device for laser channel

An etching device and channel technology, applied in laser welding equipment, welding equipment, metal processing equipment, etc., can solve the problem of slow development of laser channel etching device

Inactive Publication Date: 2016-01-13
QUANZHOU HUANGZHANG INTELLIGENT TECH CO LTD
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] At present, the research and development of laser etching technology is in its infancy, especially the development process of similar laser channel etching devices is slow, so it is necessary to propose a laser channel micro etching device

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Miniature etching device for laser channel
  • Miniature etching device for laser channel
  • Miniature etching device for laser channel

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] In order to facilitate the understanding of those skilled in the art, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments.

[0020] Such as figure 1 As shown, a laser channel micro-etching device includes a circuit assembly, a total mirror 1, a Q-Switch2, a crystal cavity 3, a mirror 4, a power meter 5, a Shtter 6, a fiber coupler 7, and an optical fiber 8.

[0021] In terms of specific structure, total mirror 1 is connected to Q-Switch2, Q-Switch2 is connected to crystal cavity 3 and is located between total mirror 1 and crystal cavity 3, and crystal cavity 3 is connected to mirror 4 and is located in Q-Switch6 Between the mirror 4, the mirror 4 and the power meter 5 and between the crystal cavity 3 and the power meter 5, the power meter 5 is connected to the Shtter 6 and between the mirror 4 and the Shtter 6, and the Shtter 6 is connected to the fiber coupler 7. And between the power meter 5 and the op...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a miniature etching device for a laser channel. The miniature etching device comprises a circuit assembly, a full reflector, a Q-Switch, a crystal cavity, a reflector, a power meter, a Shtter and an optical fiber coupler. According to the specific structure, the full reflector is connected with the Q-Switch, the Q-Switch is connected with the crystal cavity and located between the full reflector and the crystal cavity, the crystal cavity is connected with the reflector and located between the Q-Switch and the reflector, the reflector is connected with the power meter and located between the crystal cavity and the power meter, the power meter is connected with the Shtter and located between the reflector and the Shtter, the Shtter is connected with the optical fiber coupler and located between the power meter and the optical fiber coupler, the optical fiber coupler is connected with an optical fiber and located between the Shtter and the optical fiber, and a circuit assembly is a connection circuit provided for the miniature etching device for the laser channel. The miniature etching device for the laser channel can adapt to the development of the laser etching technology, the laser etching device is simple and practical, and the technology can be developed.

Description

Technical field [0001] The invention relates to the field of laser equipment, in particular to a laser channel micro-etching device. Background technique [0002] Etching technology belongs to the field of photosensitive chemistry technology, and is a method of processing thin precision metal products by photolithography. The basic principle is to use the photosensitive characteristics of chemical photosensitive materials to uniformly coat photosensitive materials on both sides of the base metal substrate. Using photolithography, the shape of the grid on the rubber film plate is accurately copied to the photosensitive layer mask on both sides of the metal substrate. The film is developed to remove the mask of the non-sensitized part, and the exposed metal part is directly sprayed and pressed with the corrosive liquid in the subsequent processing to be etched away, and finally obtain the required geometric shape and high-precision size product technology etching technology . [00...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B23K26/362
Inventor 张秀平
Owner QUANZHOU HUANGZHANG INTELLIGENT TECH CO LTD