A method of etching a soft dielectric substrate to form a circuit
A dielectric substrate and circuit technology, applied in the field of microwave and millimeter wave integrated circuit manufacturing, can solve the problems of incomplete etching of the gold layer, prolonged etching time, increased etching time, etc., and achieve wide process window, strong stability, and use safe effect
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Embodiment 1
[0028] combine figure 1 As shown, a method for etching a soft dielectric substrate to form a circuit includes the following steps:
[0029] Step 1 provides a soft dielectric substrate 101, such as figure 2 shown. The soft dielectric substrate 101 is made of polytetrafluoroethylene RT / duroid 5880 with a thickness of 0.127mm.
[0030] The surface of the dielectric substrate 101 is covered with a copper conductor layer 102 and a gold conductor layer 104 sequentially from inside to outside. The thickness of the copper conductor layer 102 is 17 μm, and the thickness of the gold conductor layer 104 is 2 μm.
[0031] A resist 105 pattern is formed on the gold conductor layer 104, and the resist may be a UV-sensitive positive photoresist.
[0032] The formation process of the resist 105 pattern is as follows: Spin-coat a layer of BP-218 type positive photoresist on the surface of the gold conductor layer 104, the coating rotation speed is 3000rpm, the coating time is 30s, and then...
Embodiment 2
[0039] combine figure 1 As shown, a method for etching a soft dielectric substrate to form a circuit includes the following steps:
[0040] Step 1 provides a soft dielectric substrate 101, such as figure 2 shown. The soft dielectric substrate 101 is made of polytetrafluoroethylene RT / duroid 5870 with a thickness of 0.254 mm.
[0041] The surface of the dielectric substrate 101 is covered with a copper conductor layer 102 and a gold conductor layer 104 sequentially from inside to outside. The thickness of the copper conductor layer 102 is 17 μm, and the thickness of the gold conductor layer 104 is 2 μm.
[0042] A resist 105 pattern is formed on the gold conductor layer 104, and the resist is an ultraviolet-sensitive negative photoresist.
[0043] The formation process of the resist 105 pattern is as follows: Spin-coat a layer of BN308-150 negative photoresist on the surface of the gold conductor layer 104, the coating rotation speed is 4000rpm, and the coating time is 30s,...
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