9results about How to "Process window width" patented technology

The invention relates to a phase shift mask substrate and a dynamic magnetron sputtering preparation method thereof, a MoSi-based gradient film layer is continuously and dynamically deposited on the substrate, and the method comprises the following steps: carrying out first-stage deposition on the substrate by adopting a molybdenum-silicon alloy target so as to form a transition layer; carrying out second-stage deposition on the transition layer to form a main body functional layer through deposition; and third-stage deposition is carried out on the main body functional layer to form a surface modification layer through deposition, and the MoSi-based gradient film layer is obtained. The invention provides a one-step sputtering deposition method capable of dynamically and accurately regulating and controlling, so that the inherent contradiction between the performance and the stress of a single-layer uniform film is fundamentally solved, and the complexity and the uncertainty of a traditional multi-step process are avoided.

The application belongs to the technical field of semiconductor manufacturing, and discloses an inert gas assisted pixel planarization etching method, which comprises the following steps: etching a ROIC wafer with a metal column and a dielectric layer by using a mixed plasma containing fluorine-containing gas and oxygen-containing gas, and stopping etching when the metal column is completely exposed or slightly exposed; after the first step of etching is completed, stop feeding the fluorine-containing gas and the oxygen-containing gas, feed inert gas, and etch the surface of the ROIC wafer by using the inert gas plasma. By separating and combining the high-selectivity chemical etching and the low-selectivity physical polishing etching function, on the basis of controlling the first etching time to prevent the formation of pits, the second inert gas physical sputtering is used for surface smoothing and metal column height fine adjustment, the high planarity of the metal column and the dielectric layer surface is realized, the ideal interface foundation is provided for subsequent electrode deposition, and the device performance and the yield are improved.

This application relates to a spraying process for a highly corrosion- and wear-resistant yttrium oxide composite coating, aiming to solve the problems of high porosity, poor high-temperature stability, and insufficient wear resistance of existing yttrium oxide coatings. The process includes degreasing and cleaning, pure water immersion, sandblasting roughening, steam and water rinsing, ultrasonic cleaning, pre-drying, plasma spraying, orthogonal experimental parameter optimization, deep ultrasonic cleaning, and final drying and curing. A yttrium oxide and zirconium oxide composite powder is used to form a dense coating under optimized plasma spraying parameters, and high cleanliness is ensured through multi-stage cleaning and clean environment control. Through the above technical solution, this application significantly improves the coating's density, chemical stability, wear resistance, and thermal shock resistance, effectively blocks the penetration of corrosive media, reduces particulate contamination, and meets the stringent requirements of semiconductor etching equipment for long-lasting protective coatings.

This invention relates to the field of sodium-ion battery technology, specifically disclosing a sodium iron pyrophosphate (NFPP) cathode material, its preparation method, and its application. The preparation method includes: using iron phosphate as the iron source, mixing it with a specific sodium source, phosphorus source, and composite carbon source; adjusting with deionized water; and then performing precision sand milling to control the slurry particle size D50 within 0.30~0.35 μm to ensure uniform elemental mixing; subsequently, spray drying is performed to obtain a precursor with high sphericity and narrow particle size distribution; finally, programmed sintering is carried out under an inert atmosphere to obtain the final product. This invention solves the problems of uneven elemental distribution, impurity phase formation, low material compaction density, and poor electrochemical performance in existing technologies through synergistic optimization of the entire process chain of sand milling-spray drying-sintering. The obtained NFPP material has a high-purity phase structure. The sodium iron pyrophosphate cathode material prepared by the method of this invention can achieve a 0.1C discharge specific capacity of 101 mA·hg. ‑1 The 1C discharge specific capacity can reach 93 mA·hg ‑1 It is suitable for the preparation of high-performance sodium-ion batteries.

The application discloses a salicylaldehyde Schiff base corrosion inhibitor and a preparation and application method thereof. The corrosion inhibitor is salicylaldehyde condensation-1,3-propanediamine Schiff base 2. A nitrogen atom on a -RC=N- in a molecule and an oxygen atom adjacent to the nitrogen atom and having excess electrons form a stable coordination bond with a metal atom, and a dense adsorption protective film is formed on a low-carbon steel surface. In the application, anhydrous ethanol is used as a conventional reaction medium, and a high-purity target product can be obtained through one-step condensation at normal pressure and at medium temperature. The corrosion inhibitor does not contain heavy metals and strong toxicity groups, is green and environment-friendly, does not need special treatment after use, and further reduces application cost, and can be widely applied to corrosion protection scenes in an acidic environment of low-carbon steel.

The application discloses a synthesis method of 9-bromoanthracene and belongs to the technical field of organic synthesis. Anthracene is used as raw material, inorganic bromide salt is used as a bromine source, hydrogen peroxide is used as an oxidant, and 9-bromoanthracene is synthesized in a mixed solvent under the catalysis of a composite Lewis acid with high selectivity; the crude product is purified through step-by-step fractional recrystallization to obtain a high-purity product. Through the synergistic effect of the composite catalytic system and the mixed solvent, the generation of the difficult-to-remove by-product 9,10-dibromoanthracene is inhibited from the source, and the efficient separation of the product and the key impurities can be realized without column chromatography by combining the gradient cooling fractional crystallization process. The process is green and safe, simple to operate, low in cost and easy to industrialize, and the prepared 9-bromoanthracene can meet the application requirements in high-end fields such as OLED photoelectric materials.

The invention discloses a carbon-coated pre-magnesium silicon monoxide negative electrode material and a preparation method thereof, the negative electrode material comprises a silicon core, a silicon-magnesium composite porous layer and a carbon-coated layer, the silicon-magnesium composite porous layer comprises MgSiO3 and Mg2SiO4 with porous characteristics, and the porosity is not less than 30%; the material shows a unique peak position and intensity relationship in an XRD diffraction pattern, and Mg2SiO4 is used as a main phase. According to the preparation method, through molten salt mediated low-temperature solid-phase reaction and addition of reducing gas during heat treatment, energy consumption is greatly reduced, a generated Mg2SiO4 crystal structure is more stable than traditional MgSiO3, and a porous structure (porosity is larger than 30%) formed through the cooperation reaction enables the material to maintain high capacity of 1621.49 mAh / g, meanwhile, the first efficiency is improved to 85.91%, and the cyclic expansion rate is reduced by 40% or above.

This invention discloses an etching method for a special passivation layer structure with high light transmittance (clear ratio, CR). The invention employs a customized "step-by-step etching" process: the first stage uses high-pressure, high-RF power physical bombardment in an argon (Ar)-rich gas environment to rapidly etch the passivation layer and most of the TiN through enhanced physical bombardment; the second stage uses low-pressure, low-RF power and adjusted gas ratios to uniformly etch the remaining TiN while minimizing damage to the substrate. This method simultaneously solves the problems of TiN residue, substrate over-etching damage, and surface defects, significantly improving product reliability and yield.

The application provides a Fe3O4 / MXene / PAI composite coating material and a preparation method and application thereof, and belongs to the technical field of material surface engineering. Fe3O4 is dispersed and modified first, then is mixed with PAI resin to form a slurry, and is sprayed on the surface of a metal substrate modified by a silane coupling agent; a static magnetic field is applied to induce the directional arrangement of Fe3O4 along the thickness direction of the coating, and then heat curing is performed to obtain a composite coating material. The application utilizes the magnetism of Fe3O4 and the two-dimensional self-lubricating property of MXene, realizes the ordered distribution of the reinforcing phase and the 'point-surface' synergistic reinforcement through magnetic field induction, significantly improves the wear resistance and friction reduction performance of the coating, and simultaneously enhances the interface bonding force through silane coupling agent modification, so that the process is simple and controllable and is suitable for complex-shaped workpieces such as gears.