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Chemi-mechanical polishing fluid

A chemical-mechanical and polishing liquid technology, used in polishing compositions containing abrasives, electrical components, semiconductor/solid-state device manufacturing, etc. Effects of polysilicon residue, productivity improvement, and high degree of planarization

Inactive Publication Date: 2012-07-04
ANJI MICROELECTRONICS (SHANGHAI) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The purpose of the present invention is to solve the problem that the above-mentioned polysilicon / silicon dioxide selectivity ratio is too high, and the remaining polysilicon in the silicon dioxide butterfly-shaped depression is difficult to remove, and to provide a kind of polysilicon / silicon dioxide with suitable polysilicon for polishing polysilicon CMP

Method used

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Embodiment 1

[0029] The chemical mechanical polishing fluid of embodiment 1 polysilicon

[0030] Table 1 has provided the formula of polysilicon chemical mechanical polishing liquid 1~36 of the present invention, mixes uniformly by each component and content thereof given in the table, water makes up the mass percentage to 100%, adopts potassium hydroxide and nitric acid etc. to adjust to The polishing liquid of each embodiment can be prepared at a suitable pH value, and water is the balance.

[0031] Table 1 Chemical Mechanical Polishing Fluids for Polysilicon 1-36

[0032]

[0033]

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PUM

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Abstract

The invention relates to a polishing fluid for chemi-mechanically polishing silicon. The polishing fluid contains water, grinding particles, at least one silicon accelerator and at least one silicon inhibitor. The amounts of the silicon accelerator and the silicon inhibitor can be adjusted to adjust the selection ratio of silicon to silicon dioxide, thereby enhancing the flattening efficiency.

Description

technical field [0001] The invention relates to a chemical mechanical polishing fluid, in particular to a chemical mechanical polishing fluid for polishing polysilicon. Background technique [0002] In the manufacture of integrated circuits, the standard of interconnect technology is increasing, and layers are deposited on top of each other, resulting in the formation of irregular topography on the substrate surface. A planarization method used in the prior art is chemical mechanical polishing (CMP). The CMP process uses a mixture containing abrasives and a polishing pad to polish the surface of a silicon wafer. In a typical chemical mechanical polishing method, the substrate is placed in direct contact with a rotating polishing pad, applying pressure on the backside of the substrate. During polishing, the pad and stage are rotated while maintaining a downward force on the backside of the substrate to apply an abrasive and chemically active solution (commonly called a polis...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02H01L21/302
Inventor 荆建芬张建蔡鑫元
Owner ANJI MICROELECTRONICS (SHANGHAI) CO LTD
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