Chemi-mechanical polishing fluid
A chemical-mechanical and polishing liquid technology, used in polishing compositions containing abrasives, electrical components, semiconductor/solid-state device manufacturing, etc. Effects of polysilicon residue, productivity improvement, and high degree of planarization
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Embodiment 1
[0029] The chemical mechanical polishing fluid of embodiment 1 polysilicon
[0030] Table 1 has provided the formula of polysilicon chemical mechanical polishing liquid 1~36 of the present invention, mixes uniformly by each component and content thereof given in the table, water makes up the mass percentage to 100%, adopts potassium hydroxide and nitric acid etc. to adjust to The polishing liquid of each embodiment can be prepared at a suitable pH value, and water is the balance.
[0031] Table 1 Chemical Mechanical Polishing Fluids for Polysilicon 1-36
[0032]
[0033]
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