A kind of orthogonality testing method and device
A technology for testing devices and testing methods, which is applied in the direction of measuring devices, optical devices, instruments, etc., and can solve the problems of not being able to measure multiple sets of data at the same time, cumbersome calculations, and long calculation times
Active Publication Date: 2018-06-12
TIANJIN JINXIN MICROELECTRONICS TECH CO LTD
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Problems solved by technology
The existing measurement methods are cumbersome to calculate, and cannot measure multiple sets of data at the same time, adding additional calculation steps, so the calculation time is longer
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[0024] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0025] see figure 1 and figure 2 , an orthogonality testing method provided by an embodiment of the present invention is applied to an orthogonality testing device, and the orthogonality testing device includes a calibration unit 202, an image acquisition unit 203 and a processing unit 204, and the calibration unit 202 is fixed Installed on the measured two-dimensional movable platform 201, the image acquisition unit 203 is electrically connected to the proces...
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The invention provides an orthogonality test method and device, and belongs to the technical field of semiconductor industry lithography. The orthogonality test device comprises a calibration unit used for providing a standard reference frame, an image acquisition unit used for acquiring fixed point information, and a processing unit used for acquiring relevant coordinate information and obtaining a test result. The calibration graphs of the calibration unit are acquired by the image acquisition device, and differential ratio of the movement angle of a two-dimensional movable platform to the calibration angle of the calibration unit is acquired by the processing unit so that an orthogonality angle can be obtained. The technical effects that multiple sets of data are obtained simultaneously, the test method is simple and the calculation steps are less can be achieved by aiming at the technical problems in the prior art that the orthogonality test method of the two-dimensional movable platform cannot obtain multiple sets of data simultaneously through testing, the calculation steps are increased and the calculation method is complicated.
Description
technical field [0001] The invention relates to the technical field of photolithography in the semiconductor industry, in particular to an orthogonality testing method and device. Background technique [0002] Photolithography technology refers to the printing of characteristic patterns on the surface of a substrate, which can include semiconductor devices, various integrated circuits, flat-panel displays (liquid crystal displays, etc.), circuit boards, biochips, micromechanical electronic chips, Chips such as optoelectronic circuit chips. [0003] In lithography technology, the polar textile is projected onto the designated position of the substrate surface in the feature pattern on the base platform of the precision mobile platform, through the exposure device in the lithography equipment. In order to ensure the precise positioning of the graphics projection position, a series of parameters need to be calibrated, among which the orthogonality calibration of the mobile pla...
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IPC IPC(8): G01B11/26
CPCG01B11/26
Inventor 王在超刘涛张昌清
Owner TIANJIN JINXIN MICROELECTRONICS TECH CO LTD