Enhanced digital-light-processing mask exposure rapid prototyping method and apparatus

Abstract

The invention provides an enhanced digital-light-processing mask exposure rapid prototyping method and apparatus. The apparatus comprise a control platform, a digital light processing unit, and a laser marking unit. The control platform is used for carrying out lamination processing on a model of a prototyping object and bitmap processing is carried out on a laminated layer, so that a bitmap zone of the laminated layer is divided into a main body area and a boundary filling area. The digital light processing unit is controlled by the control platform to send out a first beam of light applied to the main body area in the bitmap corresponding to the laminated layer of the prototyping object. The laser marking unit is controlled by the control platform to send out a second beam of light applied to the boundary filling area in the bitmap corresponding to the laminated layer of the prototyping object. Prototyping of the main body area by he digital light processing unit and prototyping of the boundary filling area by the laser marking unit are carried out in parallel. According to the invention, a defect of edge distortion can be overcome on the premise that the high-speed prototyping is met, so that the prototyping precision of the object can be improved.

Description

technical field [0001] The invention relates to rapid prototyping technology, in particular to high-precision rapid prototyping technology. Background technique [0002] Existing rapid prototyping technologies for photocurable resins mainly include SLA (stereolithography apparatus, stereolithography rapid prototyping technology) and DLP (Digital Light Processing, digital light processing technology). Because DLP rapid prototyping technology is not only simple in equipment, but also much faster than SLA rapid prototyping technology, DLP rapid prototyping technology is more popular in the market. At the same time, DLP surface exposure rapid prototyping technology has high precision, which is especially suitable for metal jewelry lost wax casting and other fields. However, the graphics exposed in the current DLP surface exposure molding are bitmaps converted from vector graphics, see figure 1 , the vector section of the three-dimensional model, taking a circle as an example, ...

AI Technical Summary

Problems solved by technology

In this way, there is a difference between the area exposed by the DLP surface and the vector section of the 3D model, resulting in deformation of the molded object to a certain extent; There is a larger ratio, which will affect the forming accuracy of the object

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