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Inspection device and control method of the same

A technology of inspection device and control method, which is applied to measurement devices, optical devices, testing of machine/structural components, etc., can solve problems such as difficulty in removing secondary reflection noise, and achieve the effect of suppressing secondary reflection noise

Active Publication Date: 2016-07-20
ORMON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this conventional method is only a method of combining measurement results in multiple directions to try to reduce the influence of noise, and it is not a method to fundamentally solve the occurrence of secondary reflection noise
Therefore, in an environment where secondary reflection occurs regardless of the direction from which the pattern image is irradiated (for example, when there are many tall objects around), it is difficult to remove the influence of secondary reflection noise by conventional methods.

Method used

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  • Inspection device and control method of the same
  • Inspection device and control method of the same
  • Inspection device and control method of the same

Examples

Experimental program
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Effect test

no. 1 approach ＞

[0077] (Hardware configuration of PCB inspection system)

[0078] refer to figure 1 , the overall configuration of the substrate inspection system according to the first embodiment of the present invention will be described. figure 1 It is a schematic diagram showing the hardware configuration of the substrate inspection system. The board inspection system includes a board inspection device 1 that inspects the state of components and solder on a printed board using captured images, and a training device 2 that generates inspection programs used by the board inspection device 1 during inspection. This substrate inspection apparatus 1 is preferably used for substrate appearance inspection in a surface mount production line (for example, component floating inspection after reflow, etc.).

[0079] The substrate inspection device 1 has a table 10 , a measurement unit 11 , a control device 12 , an information processing device 13 , a display device 14 , and a storage device (dat...

no. 2 approach ＞

[0115] Next, a second embodiment of the present invention will be described. Compared with the case of moving the secondary reflective object to the center of the field of view and taking pictures in the above-mentioned first embodiment, the second embodiment is characterized in that the position of the secondary reflective object in the field of view and the position of the secondary reflective object are not changed. This is the point of generating a pattern image with an appropriate projection range in accordance with the size and projecting the pattern image. Since the basic configuration of the substrate inspection system is the same as that of the first embodiment, the configuration and operations unique to this embodiment will be mainly described below.

[0116] refer to Image 6 and Figure 7 The flow of measurement and inspection by phase shift in the second embodiment will be described. Image 6 is a flowchart showing the flow of measurement and inspection, Figu...

no. 3 approach ＞

[0123] Next, a third embodiment of the present invention will be described. When there is a secondary reflection object in the field of view, in the first and second embodiments, imaging of the entire field of view using the normal pattern image and imaging of the secondary reflection object using the secondary reflection suppression pattern image are performed. In contrast, the third embodiment is characterized in that the entire field of view is captured using a secondary reflection suppression pattern image having a projection range where no light reaches the reflecting surface of the causative object instead of the normal pattern image. Since the basic configuration of the substrate inspection system is the same as that of the first embodiment, the configuration and operations unique to this embodiment will be mainly described below.

[0124] refer to Figure 8 and Figure 9 , the flow of measurement and inspection by phase shift in the third embodiment will be described. ...

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Abstract

The invention relates to an inspection device and a control method of the same. Provided is a technology that uses images taken in the state that pattern images are projected on an object to inspect the object and is used for suppressing secondary reflection noise so as to improve the reliability and enable the inspection to be impossible. If a secondary reflective object exists, which may produce a secondary reflection caused by the reflected light from the reflecting surfaces of other object, the control device performs the following control process: (1) changing the projection range of the pattern images projected from the projection device so as to enable the light not to achieve the reflecting surface; or 2) setting the projection position of the pattern images so as to separate the reflecting surfaces from the projection range of the pattern images projected from the projection device.

Description

technical field [0001] The present invention relates to an inspection device for inspecting an object using an image captured with a pattern image projected on the object. Background technique [0002] Conventionally, methods for measuring the three-dimensional shape of objects using images have been studied. For example, a method called active triangulation or active stereometry is to capture images with a pattern image (stripe pattern, dot pattern, etc.) or changes in brightness, a technology to obtain three-dimensional information of objects. As examples of the active triangulation method, a phase shift method, a spatial encoding method, and the like have been put into practical use. [0003] In these methods, there may be a phenomenon that the light reflected by an object reduces the measurement accuracy of other objects existing around. refer to Figure 12 Explain this phenomenon. Figure 12 A measurement system using an imaging device 200 and a projector 201 is show...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/25
CPCG01M11/081G01N21/8806G01N2021/8829G01N2021/95638G01N2021/95646G01N2201/0635
Inventor 藤井心平西贵行川岛优人
Owner ORMON CORP