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Electrostatic lens system and method for processing diverging ion beams

An electrostatic lens, ion beam technology, applied in circuits, discharge tubes, electrical components, etc., can solve problems such as unsuitable implementation and difficult construction.

Active Publication Date: 2019-04-05
VARIAN SEMICON EQUIP ASSOC INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, constructing such electrostatic lenses becomes difficult when only modest energy changes are required
This is because these electrostatic lens systems would require excessive bending of the lens electrodes to operate properly to collimate the ion beam, which can make this embodiment unsuitable

Method used

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  • Electrostatic lens system and method for processing diverging ion beams
  • Electrostatic lens system and method for processing diverging ion beams
  • Electrostatic lens system and method for processing diverging ion beams

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Embodiment Construction

[0015] Embodiments described herein provide apparatus and methods for controlling an ion beam in an ion implantation system. Examples of ion implantation systems include beamline ion implantation systems. Ion implantation systems encompassed by embodiments of the present invention include ion implantation systems that produce a "spot ion beam" with a cross-section in the overall shape of a spot and a ribbon ion beam with an elongated cross-section. In an embodiment of the invention, a novel electrostatic lens system is provided to adjust the beam properties of an ion beam passing therethrough. In particular, the novel electrostatic lens system can act as an electrostatic collimator and electrostatic lens for deceleration or acceleration of ion beams. As discussed below, in various embodiments, an electrostatic lens system may include three different electrodes configured to independently receive three different voltage signals. This allows the electrostatic lens to operate i...

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PUM

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Abstract

An electrostatic lens system and method of processing a diverging ion beam. The electrostatic lens system includes: a first electrode for receiving ion beams; a second electrode for receiving ion beams passing through the first electrode, wherein the convex surface of one of the first electrode and the second electrode and the other The concave surface of one defines an upstream gap; the third electrode is used to receive the ion beam after passing through the second electrode, wherein the convex surface of one of the second electrode and the third electrode and the concave surface of the other define a downstream gap, and the second electrode and the third electrode define a downstream gap. The two electrodes have two concave surfaces or two convex surfaces; and a voltage supply system for independently supplying voltage signals to the first electrode, the second electrode and the third electrode, wherein the voltage signal passes through the first electrode, the second electrode, and the third electrode as the ion beam passes through the first electrode, the second electrode, and the third electrode. The second electrode and the third electrode accelerate and decelerate the ion beam. The electrostatic lens system of the present invention can act as an electrostatic collimator and electrostatic lens for deceleration or acceleration of an ion beam.

Description

technical field [0001] The present invention relates to an electrostatic lens system, and more particularly to an electrostatic lens system and a method of processing a diverging ion beam. Background technique [0002] Current ion implanters are typically used to irradiate flat substrates of large size. To facilitate large area irradiation, ion beam collimation may be performed to collimate the diverging ion beam before the ion beam impacts the substrate. Collimators are used in both ribbon beam ion implanters and spot beam ion implanters, where a ribbon beam ion implanter directs a broad ribbon beam that is In a shaped beam ion implanter, a spot or pencil beam is scanned back and forth to create a ribbon-shaped cross-section. [0003] It is also generally convenient to propagate the ion beam through a substantial portion of the beamline at its original energy extracted from the ion source or at an energy higher than that extracted from the ion source to improve ion beam t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01J37/147G02B27/30
CPCH01J37/1471H01J37/3171H01J2237/30472H01J2237/047H01J2237/2485
Inventor 法兰克·辛克莱维克多·M·本夫尼斯特
Owner VARIAN SEMICON EQUIP ASSOC INC